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authorVijayKandiah <[email protected]>2021-10-17 02:18:10 -0500
committerVijayKandiah <[email protected]>2021-10-17 02:18:10 -0500
commit84c6cf45131e42b1a724ebf7977987a9ddb70db9 (patch)
treee82f15238e79a03f3cc2435d4f9bb48d5023e8ae /src/gpuwattch/technology_xeon_core.cc
parent4a4fc87a2dcd95bfe298f2b3d18a9833a506e499 (diff)
AccelWattch dev Integration
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-/*****************************************************************************
- * McPAT
- * SOFTWARE LICENSE AGREEMENT
- * Copyright 2012 Hewlett-Packard Development Company, L.P.
- * All Rights Reserved
- *
- * Redistribution and use in source and binary forms, with or without
- * modification, are permitted provided that the following conditions are
- * met: redistributions of source code must retain the above copyright
- * notice, this list of conditions and the following disclaimer;
- * redistributions in binary form must reproduce the above copyright
- * notice, this list of conditions and the following disclaimer in the
- * documentation and/or other materials provided with the distribution;
- * neither the name of the copyright holders nor the names of its
- * contributors may be used to endorse or promote products derived from
- * this software without specific prior written permission.
-
- * THIS SOFTWARE IS PROVIDED BY THE COPYRIGHT HOLDERS AND CONTRIBUTORS
- * "AS IS" AND ANY EXPRESS OR IMPLIED WARRANTIES, INCLUDING, BUT NOT
- * LIMITED TO, THE IMPLIED WARRANTIES OF MERCHANTABILITY AND FITNESS FOR
- * A PARTICULAR PURPOSE ARE DISCLAIMED. IN NO EVENT SHALL THE COPYRIGHT
- * OWNER OR CONTRIBUTORS BE LIABLE FOR ANY DIRECT, INDIRECT, INCIDENTAL,
- * SPECIAL, EXEMPLARY, OR CONSEQUENTIAL DAMAGES (INCLUDING, BUT NOT
- * LIMITED TO, PROCUREMENT OF SUBSTITUTE GOODS OR SERVICES; LOSS OF USE,
- * DATA, OR PROFITS; OR BUSINESS INTERRUPTION) HOWEVER CAUSED AND ON ANY
- * THEORY OF LIABILITY, WHETHER IN CONTRACT, STRICT LIABILITY, OR TORT
- * (INCLUDING NEGLIGENCE OR OTHERWISE) ARISING IN ANY WAY OUT OF THE USE
- * OF THIS SOFTWARE, EVEN IF ADVISED OF THE POSSIBILITY OF SUCH DAMAGE.”
- *
- ***************************************************************************/
-
-#include "basic_circuit.h"
-
-#include "parameter.h"
-
-double wire_resistance(double resistivity, double wire_width,
- double wire_thickness, double barrier_thickness,
- double dishing_thickness, double alpha_scatter) {
- double resistance;
- resistance = alpha_scatter * resistivity /
- ((wire_thickness - barrier_thickness - dishing_thickness) *
- (wire_width - 2 * barrier_thickness));
- return (resistance);
-}
-
-double wire_capacitance(double wire_width, double wire_thickness,
- double wire_spacing, double ild_thickness,
- double miller_value, double horiz_dielectric_constant,
- double vert_dielectric_constant, double fringe_cap) {
- double vertical_cap, sidewall_cap, total_cap;
- vertical_cap = 2 * PERMITTIVITY_FREE_SPACE * vert_dielectric_constant *
- wire_width / ild_thickness;
- sidewall_cap = 2 * PERMITTIVITY_FREE_SPACE * miller_value *
- horiz_dielectric_constant * wire_thickness / wire_spacing;
- total_cap = vertical_cap + sidewall_cap + fringe_cap;
- return (total_cap);
-}
-
-void init_tech_params(double technology, bool is_tag) {
- int iter, tech, tech_lo, tech_hi;
- double curr_alpha, curr_vpp;
- double wire_width, wire_thickness, wire_spacing, fringe_cap,
- pmos_to_nmos_sizing_r;
- // double aspect_ratio,ild_thickness, miller_value = 1.5,
- // horiz_dielectric_constant, vert_dielectric_constant;
- double barrier_thickness, dishing_thickness, alpha_scatter;
- double curr_vdd_dram_cell, curr_v_th_dram_access_transistor,
- curr_I_on_dram_cell, curr_c_dram_cell;
-
- uint32_t ram_cell_tech_type = (is_tag) ? g_ip->tag_arr_ram_cell_tech_type
- : g_ip->data_arr_ram_cell_tech_type;
- uint32_t peri_global_tech_type = (is_tag)
- ? g_ip->tag_arr_peri_global_tech_type
- : g_ip->data_arr_peri_global_tech_type;
-
- technology = technology * 1000.0; // in the unit of nm
-
- // initialize parameters
- g_tp.reset();
- double gmp_to_gmn_multiplier_periph_global = 0;
-
- double curr_Wmemcella_dram, curr_Wmemcellpmos_dram, curr_Wmemcellnmos_dram,
- curr_area_cell_dram, curr_asp_ratio_cell_dram, curr_Wmemcella_sram,
- curr_Wmemcellpmos_sram, curr_Wmemcellnmos_sram, curr_area_cell_sram,
- curr_asp_ratio_cell_sram, curr_I_off_dram_cell_worst_case_length_temp;
- double curr_Wmemcella_cam, curr_Wmemcellpmos_cam, curr_Wmemcellnmos_cam,
- curr_area_cell_cam, // Sheng: CAM data
- curr_asp_ratio_cell_cam;
- double SENSE_AMP_D, SENSE_AMP_P; // J
- double area_cell_dram = 0;
- double asp_ratio_cell_dram = 0;
- double area_cell_sram = 0;
- double asp_ratio_cell_sram = 0;
- double area_cell_cam = 0;
- double asp_ratio_cell_cam = 0;
- double mobility_eff_periph_global = 0;
- double Vdsat_periph_global = 0;
- double nmos_effective_resistance_multiplier;
- double width_dram_access_transistor;
-
- double curr_logic_scaling_co_eff =
- 0; // This is based on the reported numbers of Intel Merom 65nm,
- // Penryn45nm and IBM cell 90/65/45 date
- double curr_core_tx_density =
- 0; // this is density per um^2; 90, ...22nm based on Intel Penryn
- double curr_chip_layout_overhead = 0;
- double curr_macro_layout_overhead = 0;
- double curr_sckt_co_eff = 0;
-
- if (technology < 91 && technology > 89) {
- tech_lo = 90;
- tech_hi = 90;
- } else if (technology < 66 && technology > 64) {
- tech_lo = 65;
- tech_hi = 65;
- } else if (technology < 46 && technology > 44) {
- tech_lo = 45;
- tech_hi = 45;
- } else if (technology < 33 && technology > 31) {
- tech_lo = 32;
- tech_hi = 32;
- } else if (technology < 23 && technology > 21) {
- tech_lo = 22;
- tech_hi = 22;
- if (ram_cell_tech_type == 3) {
- cout << "current version does not support eDRAM technologies at 22nm"
- << endl;
- exit(0);
- }
- }
- // else if (technology < 17 && technology > 15)
- // {
- // tech_lo = 16;
- // tech_hi = 16;
- // }
- else if (technology < 90 && technology > 65) {
- tech_lo = 90;
- tech_hi = 65;
- } else if (technology < 65 && technology > 45) {
- tech_lo = 65;
- tech_hi = 45;
- } else if (technology < 45 && technology > 32) {
- tech_lo = 45;
- tech_hi = 32;
- } else if (technology < 32 && technology > 22) {
- tech_lo = 32;
- tech_hi = 22;
- }
- // else if (technology < 22 && technology > 16)
- // {
- // tech_lo = 22;
- // tech_hi = 16;
- // }
- else {
- cout << "Invalid technology nodes" << endl;
- exit(0);
- }
-
- double vdd[NUMBER_TECH_FLAVORS];
- double Lphy[NUMBER_TECH_FLAVORS];
- double Lelec[NUMBER_TECH_FLAVORS];
- double t_ox[NUMBER_TECH_FLAVORS];
- double v_th[NUMBER_TECH_FLAVORS];
- double c_ox[NUMBER_TECH_FLAVORS];
- double mobility_eff[NUMBER_TECH_FLAVORS];
- double Vdsat[NUMBER_TECH_FLAVORS];
- double c_g_ideal[NUMBER_TECH_FLAVORS];
- double c_fringe[NUMBER_TECH_FLAVORS];
- double c_junc[NUMBER_TECH_FLAVORS];
- double I_on_n[NUMBER_TECH_FLAVORS];
- double I_on_p[NUMBER_TECH_FLAVORS];
- double Rnchannelon[NUMBER_TECH_FLAVORS];
- double Rpchannelon[NUMBER_TECH_FLAVORS];
- double n_to_p_eff_curr_drv_ratio[NUMBER_TECH_FLAVORS];
- double I_off_n[NUMBER_TECH_FLAVORS][101];
- double I_g_on_n[NUMBER_TECH_FLAVORS][101];
- // double I_off_p[NUMBER_TECH_FLAVORS][101];
- double gmp_to_gmn_multiplier[NUMBER_TECH_FLAVORS];
- // double curr_sckt_co_eff[NUMBER_TECH_FLAVORS];
- double long_channel_leakage_reduction[NUMBER_TECH_FLAVORS];
-
- for (iter = 0; iter <= 1; ++iter) {
- // linear interpolation
- if (iter == 0) {
- tech = tech_lo;
- if (tech_lo == tech_hi) {
- curr_alpha = 1;
- } else {
- curr_alpha = (technology - tech_hi) / (tech_lo - tech_hi);
- }
- } else {
- tech = tech_hi;
- if (tech_lo == tech_hi) {
- break;
- } else {
- curr_alpha = (tech_lo - technology) / (tech_lo - tech_hi);
- }
- }
-
- if (tech == 90) {
- SENSE_AMP_D = .28e-9; // s
- SENSE_AMP_P = 14.7e-15; // J
- // 90nm technology-node. Corresponds to year 2004 in ITRS
- // ITRS HP device type
- vdd[0] = 1.2;
- Lphy[0] = 0.037; // Lphy is the physical gate-length. micron
- Lelec[0] = 0.0266; // Lelec is the electrical gate-length. micron
- t_ox[0] = 1.2e-3; // micron
- v_th[0] = 0.23707; // V
- c_ox[0] = 1.79e-14; // F/micron2
- mobility_eff[0] = 342.16 * (1e-2 * 1e6 * 1e-2 * 1e6); // micron2 / Vs
- Vdsat[0] = 0.128; // V
- c_g_ideal[0] = 6.64e-16; // F/micron
- c_fringe[0] = 0.08e-15; // F/micron
- c_junc[0] = 1e-15; // F/micron2
- I_on_n[0] = 1076.9e-6; // A/micron
- I_on_p[0] = 712.6e-6; // A/micron
- // Note that nmos_effective_resistance_multiplier,
- // n_to_p_eff_curr_drv_ratio and gmp_to_gmn_multiplier values are
- // calculated offline
- nmos_effective_resistance_multiplier = 1.54;
- n_to_p_eff_curr_drv_ratio[0] = 2.45;
- gmp_to_gmn_multiplier[0] = 1.22;
- Rnchannelon[0] = nmos_effective_resistance_multiplier * vdd[0] /
- I_on_n[0]; // ohm-micron
- Rpchannelon[0] =
- n_to_p_eff_curr_drv_ratio[0] * Rnchannelon[0]; // ohm-micron
- long_channel_leakage_reduction[0] = 1;
- I_off_n[0][0] = 3.24e-8; // A/micron
- I_off_n[0][10] = 4.01e-8;
- I_off_n[0][20] = 4.90e-8;
- I_off_n[0][30] = 5.92e-8;
- I_off_n[0][40] = 7.08e-8;
- I_off_n[0][50] = 8.38e-8;
- I_off_n[0][60] = 9.82e-8;
- I_off_n[0][70] = 1.14e-7;
- I_off_n[0][80] = 1.29e-7;
- I_off_n[0][90] = 1.43e-7;
- I_off_n[0][100] = 1.54e-7;
-
- I_g_on_n[0][0] = 1.65e-8; // A/micron
- I_g_on_n[0][10] = 1.65e-8;
- I_g_on_n[0][20] = 1.65e-8;
- I_g_on_n[0][30] = 1.65e-8;
- I_g_on_n[0][40] = 1.65e-8;
- I_g_on_n[0][50] = 1.65e-8;
- I_g_on_n[0][60] = 1.65e-8;
- I_g_on_n[0][70] = 1.65e-8;
- I_g_on_n[0][80] = 1.65e-8;
- I_g_on_n[0][90] = 1.65e-8;
- I_g_on_n[0][100] = 1.65e-8;
-
- // ITRS LSTP device type
- vdd[1] = 1.3;
- Lphy[1] = 0.075;
- Lelec[1] = 0.0486;
- t_ox[1] = 2.2e-3;
- v_th[1] = 0.48203;
- c_ox[1] = 1.22e-14;
- mobility_eff[1] = 356.76 * (1e-2 * 1e6 * 1e-2 * 1e6);
- Vdsat[1] = 0.373;
- c_g_ideal[1] = 9.15e-16;
- c_fringe[1] = 0.08e-15;
- c_junc[1] = 1e-15;
- I_on_n[1] = 503.6e-6;
- I_on_p[1] = 235.1e-6;
- nmos_effective_resistance_multiplier = 1.92;
- n_to_p_eff_curr_drv_ratio[1] = 2.44;
- gmp_to_gmn_multiplier[1] = 0.88;
- Rnchannelon[1] =
- nmos_effective_resistance_multiplier * vdd[1] / I_on_n[1];
- Rpchannelon[1] = n_to_p_eff_curr_drv_ratio[1] * Rnchannelon[1];
- long_channel_leakage_reduction[1] = 1;
- I_off_n[1][0] = 2.81e-12;
- I_off_n[1][10] = 4.76e-12;
- I_off_n[1][20] = 7.82e-12;
- I_off_n[1][30] = 1.25e-11;
- I_off_n[1][40] = 1.94e-11;
- I_off_n[1][50] = 2.94e-11;
- I_off_n[1][60] = 4.36e-11;
- I_off_n[1][70] = 6.32e-11;
- I_off_n[1][80] = 8.95e-11;
- I_off_n[1][90] = 1.25e-10;
- I_off_n[1][100] = 1.7e-10;
-
- I_g_on_n[1][0] = 3.87e-11; // A/micron
- I_g_on_n[1][10] = 3.87e-11;
- I_g_on_n[1][20] = 3.87e-11;
- I_g_on_n[1][30] = 3.87e-11;
- I_g_on_n[1][40] = 3.87e-11;
- I_g_on_n[1][50] = 3.87e-11;
- I_g_on_n[1][60] = 3.87e-11;
- I_g_on_n[1][70] = 3.87e-11;
- I_g_on_n[1][80] = 3.87e-11;
- I_g_on_n[1][90] = 3.87e-11;
- I_g_on_n[1][100] = 3.87e-11;
-
- // ITRS LOP device type
- vdd[2] = 0.9;
- Lphy[2] = 0.053;
- Lelec[2] = 0.0354;
- t_ox[2] = 1.5e-3;
- v_th[2] = 0.30764;
- c_ox[2] = 1.59e-14;
- mobility_eff[2] = 460.39 * (1e-2 * 1e6 * 1e-2 * 1e6);
- Vdsat[2] = 0.113;
- c_g_ideal[2] = 8.45e-16;
- c_fringe[2] = 0.08e-15;
- c_junc[2] = 1e-15;
- I_on_n[2] = 386.6e-6;
- I_on_p[2] = 209.7e-6;
- nmos_effective_resistance_multiplier = 1.77;
- n_to_p_eff_curr_drv_ratio[2] = 2.54;
- gmp_to_gmn_multiplier[2] = 0.98;
- Rnchannelon[2] =
- nmos_effective_resistance_multiplier * vdd[2] / I_on_n[2];
- Rpchannelon[2] = n_to_p_eff_curr_drv_ratio[2] * Rnchannelon[2];
- long_channel_leakage_reduction[2] = 1;
- I_off_n[2][0] = 2.14e-9;
- I_off_n[2][10] = 2.9e-9;
- I_off_n[2][20] = 3.87e-9;
- I_off_n[2][30] = 5.07e-9;
- I_off_n[2][40] = 6.54e-9;
- I_off_n[2][50] = 8.27e-8;
- I_off_n[2][60] = 1.02e-7;
- I_off_n[2][70] = 1.20e-7;
- I_off_n[2][80] = 1.36e-8;
- I_off_n[2][90] = 1.52e-8;
- I_off_n[2][100] = 1.73e-8;
-
- I_g_on_n[2][0] = 4.31e-8; // A/micron
- I_g_on_n[2][10] = 4.31e-8;
- I_g_on_n[2][20] = 4.31e-8;
- I_g_on_n[2][30] = 4.31e-8;
- I_g_on_n[2][40] = 4.31e-8;
- I_g_on_n[2][50] = 4.31e-8;
- I_g_on_n[2][60] = 4.31e-8;
- I_g_on_n[2][70] = 4.31e-8;
- I_g_on_n[2][80] = 4.31e-8;
- I_g_on_n[2][90] = 4.31e-8;
- I_g_on_n[2][100] = 4.31e-8;
-
- if (ram_cell_tech_type == lp_dram) {
- // LP-DRAM cell access transistor technology parameters
- curr_vdd_dram_cell = 1.2;
- Lphy[3] = 0.12;
- Lelec[3] = 0.0756;
- curr_v_th_dram_access_transistor = 0.4545;
- width_dram_access_transistor = 0.14;
- curr_I_on_dram_cell = 45e-6;
- curr_I_off_dram_cell_worst_case_length_temp = 21.1e-12;
- curr_Wmemcella_dram = width_dram_access_transistor;
- curr_Wmemcellpmos_dram = 0;
- curr_Wmemcellnmos_dram = 0;
- curr_area_cell_dram = 0.168;
- curr_asp_ratio_cell_dram = 1.46;
- curr_c_dram_cell = 20e-15;
-
- // LP-DRAM wordline transistor parameters
- curr_vpp = 1.6;
- t_ox[3] = 2.2e-3;
- v_th[3] = 0.4545;
- c_ox[3] = 1.22e-14;
- mobility_eff[3] = 323.95 * (1e-2 * 1e6 * 1e-2 * 1e6);
- Vdsat[3] = 0.3;
- c_g_ideal[3] = 1.47e-15;
- c_fringe[3] = 0.08e-15;
- c_junc[3] = 1e-15;
- I_on_n[3] = 321.6e-6;
- I_on_p[3] = 203.3e-6;
- nmos_effective_resistance_multiplier = 1.65;
- n_to_p_eff_curr_drv_ratio[3] = 1.95;
- gmp_to_gmn_multiplier[3] = 0.90;
- Rnchannelon[3] =
- nmos_effective_resistance_multiplier * curr_vpp / I_on_n[3];
- Rpchannelon[3] = n_to_p_eff_curr_drv_ratio[3] * Rnchannelon[3];
- long_channel_leakage_reduction[3] = 1;
- I_off_n[3][0] = 1.42e-11;
- I_off_n[3][10] = 2.25e-11;
- I_off_n[3][20] = 3.46e-11;
- I_off_n[3][30] = 5.18e-11;
- I_off_n[3][40] = 7.58e-11;
- I_off_n[3][50] = 1.08e-10;
- I_off_n[3][60] = 1.51e-10;
- I_off_n[3][70] = 2.02e-10;
- I_off_n[3][80] = 2.57e-10;
- I_off_n[3][90] = 3.14e-10;
- I_off_n[3][100] = 3.85e-10;
- } else if (ram_cell_tech_type == comm_dram) {
- // COMM-DRAM cell access transistor technology parameters
- curr_vdd_dram_cell = 1.6;
- Lphy[3] = 0.09;
- Lelec[3] = 0.0576;
- curr_v_th_dram_access_transistor = 1;
- width_dram_access_transistor = 0.09;
- curr_I_on_dram_cell = 20e-6;
- curr_I_off_dram_cell_worst_case_length_temp = 1e-15;
- curr_Wmemcella_dram = width_dram_access_transistor;
- curr_Wmemcellpmos_dram = 0;
- curr_Wmemcellnmos_dram = 0;
- curr_area_cell_dram = 6 * 0.09 * 0.09;
- curr_asp_ratio_cell_dram = 1.5;
- curr_c_dram_cell = 30e-15;
-
- // COMM-DRAM wordline transistor parameters
- curr_vpp = 3.7;
- t_ox[3] = 5.5e-3;
- v_th[3] = 1.0;
- c_ox[3] = 5.65e-15;
- mobility_eff[3] = 302.2 * (1e-2 * 1e6 * 1e-2 * 1e6);
- Vdsat[3] = 0.32;
- c_g_ideal[3] = 5.08e-16;
- c_fringe[3] = 0.08e-15;
- c_junc[3] = 1e-15;
- I_on_n[3] = 1094.3e-6;
- I_on_p[3] = I_on_n[3] / 2;
- nmos_effective_resistance_multiplier = 1.62;
- n_to_p_eff_curr_drv_ratio[3] = 2.05;
- gmp_to_gmn_multiplier[3] = 0.90;
- Rnchannelon[3] =
- nmos_effective_resistance_multiplier * curr_vpp / I_on_n[3];
- Rpchannelon[3] = n_to_p_eff_curr_drv_ratio[3] * Rnchannelon[3];
- long_channel_leakage_reduction[3] = 1;
- I_off_n[3][0] = 5.80e-15;
- I_off_n[3][10] = 1.21e-14;
- I_off_n[3][20] = 2.42e-14;
- I_off_n[3][30] = 4.65e-14;
- I_off_n[3][40] = 8.60e-14;
- I_off_n[3][50] = 1.54e-13;
- I_off_n[3][60] = 2.66e-13;
- I_off_n[3][70] = 4.45e-13;
- I_off_n[3][80] = 7.17e-13;
- I_off_n[3][90] = 1.11e-12;
- I_off_n[3][100] = 1.67e-12;
- }
-
- // SRAM cell properties
- curr_Wmemcella_sram = 1.31 * g_ip->F_sz_um;
- curr_Wmemcellpmos_sram = 1.23 * g_ip->F_sz_um;
- curr_Wmemcellnmos_sram = 2.08 * g_ip->F_sz_um;
- curr_area_cell_sram = 146 * g_ip->F_sz_um * g_ip->F_sz_um;
- curr_asp_ratio_cell_sram = 1.46;
- // CAM cell properties //TODO: data need to be revisited
- curr_Wmemcella_cam = 1.31 * g_ip->F_sz_um;
- curr_Wmemcellpmos_cam = 1.23 * g_ip->F_sz_um;
- curr_Wmemcellnmos_cam = 2.08 * g_ip->F_sz_um;
- curr_area_cell_cam = 292 * g_ip->F_sz_um * g_ip->F_sz_um; // 360
- curr_asp_ratio_cell_cam = 2.92; // 2.5
- // Empirical undifferetiated core/FU coefficient
- curr_logic_scaling_co_eff = 1;
- curr_core_tx_density = 1.25 * 0.7 * 0.7;
- curr_sckt_co_eff = 1.1539;
- curr_chip_layout_overhead =
- 1.2; // die measurement results based on Niagara 1 and 2
- curr_macro_layout_overhead =
- 1.1; // EDA placement and routing tool rule of thumb
- }
-
- if (tech == 65) { // 65nm technology-node. Corresponds to year 2007 in ITRS
- // ITRS HP device type
- // SENSE_AMP_D = .2e-9; // s
- // SENSE_AMP_P = 5.7e-15; // J
- // vdd[0] = 1.1;
- // Lphy[0] = 0.025;
- // Lelec[0] = 0.019;
- // t_ox[0] = 1.1e-3;
- // v_th[0] = .19491;
- // c_ox[0] = 1.88e-14;
- // mobility_eff[0] = 436.24 * (1e-2 * 1e6 * 1e-2 * 1e6);
- // Vdsat[0] = 7.71e-2;
- // c_g_ideal[0] = 4.69e-16;
- // c_fringe[0] = 0.077e-15;
- // c_junc[0] = 1e-15;
- // I_on_n[0] = 1197.2e-6;
- // I_on_p[0] = 870.8e-6;
- // nmos_effective_resistance_multiplier = 1.50;
- // n_to_p_eff_curr_drv_ratio[0] = 2.41;
- // gmp_to_gmn_multiplier[0] = 1.38;
- // Rnchannelon[0] = nmos_effective_resistance_multiplier * vdd[0] /
- // I_on_n[0]; Rpchannelon[0] = n_to_p_eff_curr_drv_ratio[0] *
- // Rnchannelon[0]; long_channel_leakage_reduction[0] = 1/3.74;
- // //Using MASTAR, @380K, increase Lgate until Ion reduces to 90% or
- // Lgate increase by 10%, whichever comes first
- // //Ioff(Lgate normal)/Ioff(Lgate long)= 3.74.
- // I_off_n[0][0] = 1.96e-7;
- // I_off_n[0][10] = 2.29e-7;
- // I_off_n[0][20] = 2.66e-7;
- // I_off_n[0][30] = 3.05e-7;
- // I_off_n[0][40] = 3.49e-7;
- // I_off_n[0][50] = 3.95e-7;
- // I_off_n[0][60] = 4.45e-7;
- // I_off_n[0][70] = 4.97e-7;
- // I_off_n[0][80] = 5.48e-7;
- // I_off_n[0][90] = 5.94e-7;
- // I_off_n[0][100] = 6.3e-7;
- // I_g_on_n[0][0] = 4.09e-8;//A/micron
- // I_g_on_n[0][10] = 4.09e-8;
- // I_g_on_n[0][20] = 4.09e-8;
- // I_g_on_n[0][30] = 4.09e-8;
- // I_g_on_n[0][40] = 4.09e-8;
- // I_g_on_n[0][50] = 4.09e-8;
- // I_g_on_n[0][60] = 4.09e-8;
- // I_g_on_n[0][70] = 4.09e-8;
- // I_g_on_n[0][80] = 4.09e-8;
- // I_g_on_n[0][90] = 4.09e-8;
- // I_g_on_n[0][100] = 4.09e-8;
-
- SENSE_AMP_D = .2e-9; // s
- SENSE_AMP_P = 5.7e-15; // J
- vdd[0] = 1.25;
- Lphy[0] = 0.025;
- Lelec[0] = 0.019;
- t_ox[0] = 1.1e-3;
- v_th[0] = .12491;
- c_ox[0] = 1.88e-14;
- mobility_eff[0] = 409.31 * (1e-2 * 1e6 * 1e-2 * 1e6);
- Vdsat[0] = 9.08e-2;
- c_g_ideal[0] = 4.72e-16;
- c_fringe[0] = 0.08e-15;
- c_junc[0] = 1e-15;
- I_on_n[0] = 1486.4e-6;
- I_on_p[0] = 1131.5e-6;
- nmos_effective_resistance_multiplier = 1.57;
- n_to_p_eff_curr_drv_ratio[0] = 2;
- gmp_to_gmn_multiplier[0] = 1.38;
- Rnchannelon[0] =
- nmos_effective_resistance_multiplier * vdd[0] / I_on_n[0];
- Rpchannelon[0] = n_to_p_eff_curr_drv_ratio[0] * Rnchannelon[0];
- long_channel_leakage_reduction[0] = 1.0 / 4.97;
- // Using MASTAR, @380K, increase Lgate until Ion reduces to 90% or Lgate
- // increase by 10%, whichever comes first Ioff(Lgate normal)/Ioff(Lgate
- // long)= 4.97@Vdd=1.25; (3.74@Vdd=1.1), however, Intel paper suggest the
- // reduction factor is 3.
- I_off_n[0][0] = 8.62e-7;
- I_off_n[0][10] = 9.08e-7;
- I_off_n[0][20] = 9.55e-7;
- I_off_n[0][30] = 1.00e-6;
- I_off_n[0][40] = 1.05e-6;
- I_off_n[0][50] = 1.09e-6;
- I_off_n[0][60] = 1.14e-6;
- I_off_n[0][70] = 1.18e-6;
- I_off_n[0][80] = 1.23e-6;
- I_off_n[0][90] = 1.27e-6;
- I_off_n[0][100] = 1.31e-6;
-
- I_g_on_n[0][0] = 7.02e-8; // A/micron
- I_g_on_n[0][10] = 7.02e-8;
- I_g_on_n[0][20] = 7.02e-8;
- I_g_on_n[0][30] = 7.02e-8;
- I_g_on_n[0][40] = 7.02e-8;
- I_g_on_n[0][50] = 7.02e-8;
- I_g_on_n[0][60] = 7.02e-8;
- I_g_on_n[0][70] = 7.02e-8;
- I_g_on_n[0][80] = 7.02e-8;
- I_g_on_n[0][90] = 7.02e-8;
- I_g_on_n[0][100] = 7.02e-8;
-
- // ITRS LSTP device type
- vdd[1] = 1.2;
- Lphy[1] = 0.045;
- Lelec[1] = 0.0298;
- t_ox[1] = 1.9e-3;
- v_th[1] = 0.52354;
- c_ox[1] = 1.36e-14;
- mobility_eff[1] = 341.21 * (1e-2 * 1e6 * 1e-2 * 1e6);
- Vdsat[1] = 0.128;
- c_g_ideal[1] = 6.14e-16;
- c_fringe[1] = 0.08e-15;
- c_junc[1] = 1e-15;
- I_on_n[1] = 519.2e-6;
- I_on_p[1] = 266e-6;
- nmos_effective_resistance_multiplier = 1.96;
- n_to_p_eff_curr_drv_ratio[1] = 2.23;
- gmp_to_gmn_multiplier[1] = 0.99;
- Rnchannelon[1] =
- nmos_effective_resistance_multiplier * vdd[1] / I_on_n[1];
- Rpchannelon[1] = n_to_p_eff_curr_drv_ratio[1] * Rnchannelon[1];
- long_channel_leakage_reduction[1] = 1 / 2.82;
- I_off_n[1][0] = 9.12e-12;
- I_off_n[1][10] = 1.49e-11;
- I_off_n[1][20] = 2.36e-11;
- I_off_n[1][30] = 3.64e-11;
- I_off_n[1][40] = 5.48e-11;
- I_off_n[1][50] = 8.05e-11;
- I_off_n[1][60] = 1.15e-10;
- I_off_n[1][70] = 1.59e-10;
- I_off_n[1][80] = 2.1e-10;
- I_off_n[1][90] = 2.62e-10;
- I_off_n[1][100] = 3.21e-10;
-
- I_g_on_n[1][0] = 1.09e-10; // A/micron
- I_g_on_n[1][10] = 1.09e-10;
- I_g_on_n[1][20] = 1.09e-10;
- I_g_on_n[1][30] = 1.09e-10;
- I_g_on_n[1][40] = 1.09e-10;
- I_g_on_n[1][50] = 1.09e-10;
- I_g_on_n[1][60] = 1.09e-10;
- I_g_on_n[1][70] = 1.09e-10;
- I_g_on_n[1][80] = 1.09e-10;
- I_g_on_n[1][90] = 1.09e-10;
- I_g_on_n[1][100] = 1.09e-10;
-
- // ITRS LOP device type
- vdd[2] = 0.8;
- Lphy[2] = 0.032;
- Lelec[2] = 0.0216;
- t_ox[2] = 1.2e-3;
- v_th[2] = 0.28512;
- c_ox[2] = 1.87e-14;
- mobility_eff[2] = 495.19 * (1e-2 * 1e6 * 1e-2 * 1e6);
- Vdsat[2] = 0.292;
- c_g_ideal[2] = 6e-16;
- c_fringe[2] = 0.08e-15;
- c_junc[2] = 1e-15;
- I_on_n[2] = 573.1e-6;
- I_on_p[2] = 340.6e-6;
- nmos_effective_resistance_multiplier = 1.82;
- n_to_p_eff_curr_drv_ratio[2] = 2.28;
- gmp_to_gmn_multiplier[2] = 1.11;
- Rnchannelon[2] =
- nmos_effective_resistance_multiplier * vdd[2] / I_on_n[2];
- Rpchannelon[2] = n_to_p_eff_curr_drv_ratio[2] * Rnchannelon[2];
- long_channel_leakage_reduction[2] = 1 / 2.05;
- I_off_n[2][0] = 4.9e-9;
- I_off_n[2][10] = 6.49e-9;
- I_off_n[2][20] = 8.45e-9;
- I_off_n[2][30] = 1.08e-8;
- I_off_n[2][40] = 1.37e-8;
- I_off_n[2][50] = 1.71e-8;
- I_off_n[2][60] = 2.09e-8;
- I_off_n[2][70] = 2.48e-8;
- I_off_n[2][80] = 2.84e-8;
- I_off_n[2][90] = 3.13e-8;
- I_off_n[2][100] = 3.42e-8;
-
- I_g_on_n[2][0] = 9.61e-9; // A/micron
- I_g_on_n[2][10] = 9.61e-9;
- I_g_on_n[2][20] = 9.61e-9;
- I_g_on_n[2][30] = 9.61e-9;
- I_g_on_n[2][40] = 9.61e-9;
- I_g_on_n[2][50] = 9.61e-9;
- I_g_on_n[2][60] = 9.61e-9;
- I_g_on_n[2][70] = 9.61e-9;
- I_g_on_n[2][80] = 9.61e-9;
- I_g_on_n[2][90] = 9.61e-9;
- I_g_on_n[2][100] = 9.61e-9;
-
- if (ram_cell_tech_type == lp_dram) {
- // LP-DRAM cell access transistor technology parameters
- curr_vdd_dram_cell = 1.2;
- Lphy[3] = 0.12;
- Lelec[3] = 0.0756;
- curr_v_th_dram_access_transistor = 0.43806;
- width_dram_access_transistor = 0.09;
- curr_I_on_dram_cell = 36e-6;
- curr_I_off_dram_cell_worst_case_length_temp = 19.6e-12;
- curr_Wmemcella_dram = width_dram_access_transistor;
- curr_Wmemcellpmos_dram = 0;
- curr_Wmemcellnmos_dram = 0;
- curr_area_cell_dram = 0.11;
- curr_asp_ratio_cell_dram = 1.46;
- curr_c_dram_cell = 20e-15;
-
- // LP-DRAM wordline transistor parameters
- curr_vpp = 1.6;
- t_ox[3] = 2.2e-3;
- v_th[3] = 0.43806;
- c_ox[3] = 1.22e-14;
- mobility_eff[3] = 328.32 * (1e-2 * 1e6 * 1e-2 * 1e6);
- Vdsat[3] = 0.43806;
- c_g_ideal[3] = 1.46e-15;
- c_fringe[3] = 0.08e-15;
- c_junc[3] = 1e-15;
- I_on_n[3] = 399.8e-6;
- I_on_p[3] = 243.4e-6;
- nmos_effective_resistance_multiplier = 1.65;
- n_to_p_eff_curr_drv_ratio[3] = 2.05;
- gmp_to_gmn_multiplier[3] = 0.90;
- Rnchannelon[3] =
- nmos_effective_resistance_multiplier * curr_vpp / I_on_n[3];
- Rpchannelon[3] = n_to_p_eff_curr_drv_ratio[3] * Rnchannelon[3];
- long_channel_leakage_reduction[3] = 1;
- I_off_n[3][0] = 2.23e-11;
- I_off_n[3][10] = 3.46e-11;
- I_off_n[3][20] = 5.24e-11;
- I_off_n[3][30] = 7.75e-11;
- I_off_n[3][40] = 1.12e-10;
- I_off_n[3][50] = 1.58e-10;
- I_off_n[3][60] = 2.18e-10;
- I_off_n[3][70] = 2.88e-10;
- I_off_n[3][80] = 3.63e-10;
- I_off_n[3][90] = 4.41e-10;
- I_off_n[3][100] = 5.36e-10;
- } else if (ram_cell_tech_type == comm_dram) {
- // COMM-DRAM cell access transistor technology parameters
- curr_vdd_dram_cell = 1.3;
- Lphy[3] = 0.065;
- Lelec[3] = 0.0426;
- curr_v_th_dram_access_transistor = 1;
- width_dram_access_transistor = 0.065;
- curr_I_on_dram_cell = 20e-6;
- curr_I_off_dram_cell_worst_case_length_temp = 1e-15;
- curr_Wmemcella_dram = width_dram_access_transistor;
- curr_Wmemcellpmos_dram = 0;
- curr_Wmemcellnmos_dram = 0;
- curr_area_cell_dram = 6 * 0.065 * 0.065;
- curr_asp_ratio_cell_dram = 1.5;
- curr_c_dram_cell = 30e-15;
-
- // COMM-DRAM wordline transistor parameters
- curr_vpp = 3.3;
- t_ox[3] = 5e-3;
- v_th[3] = 1.0;
- c_ox[3] = 6.16e-15;
- mobility_eff[3] = 303.44 * (1e-2 * 1e6 * 1e-2 * 1e6);
- Vdsat[3] = 0.385;
- c_g_ideal[3] = 4e-16;
- c_fringe[3] = 0.08e-15;
- c_junc[3] = 1e-15;
- I_on_n[3] = 1031e-6;
- I_on_p[3] = I_on_n[3] / 2;
- nmos_effective_resistance_multiplier = 1.69;
- n_to_p_eff_curr_drv_ratio[3] = 2.39;
- gmp_to_gmn_multiplier[3] = 0.90;
- Rnchannelon[3] =
- nmos_effective_resistance_multiplier * curr_vpp / I_on_n[3];
- Rpchannelon[3] = n_to_p_eff_curr_drv_ratio[3] * Rnchannelon[3];
- long_channel_leakage_reduction[3] = 1;
- I_off_n[3][0] = 1.80e-14;
- I_off_n[3][10] = 3.64e-14;
- I_off_n[3][20] = 7.03e-14;
- I_off_n[3][30] = 1.31e-13;
- I_off_n[3][40] = 2.35e-13;
- I_off_n[3][50] = 4.09e-13;
- I_off_n[3][60] = 6.89e-13;
- I_off_n[3][70] = 1.13e-12;
- I_off_n[3][80] = 1.78e-12;
- I_off_n[3][90] = 2.71e-12;
- I_off_n[3][100] = 3.99e-12;
- }
-
- // SRAM cell properties
- curr_Wmemcella_sram = 1.31 * g_ip->F_sz_um;
- curr_Wmemcellpmos_sram = 1.23 * g_ip->F_sz_um;
- curr_Wmemcellnmos_sram = 2.08 * g_ip->F_sz_um;
- curr_area_cell_sram = 146 * g_ip->F_sz_um * g_ip->F_sz_um;
- curr_asp_ratio_cell_sram = 1.46;
- // CAM cell properties //TODO: data need to be revisited
- curr_Wmemcella_cam = 1.31 * g_ip->F_sz_um;
- curr_Wmemcellpmos_cam = 1.23 * g_ip->F_sz_um;
- curr_Wmemcellnmos_cam = 2.08 * g_ip->F_sz_um;
- curr_area_cell_cam = 292 * g_ip->F_sz_um * g_ip->F_sz_um;
- curr_asp_ratio_cell_cam = 2.92;
- // Empirical undifferetiated core/FU coefficient
- curr_logic_scaling_co_eff = 0.7;
- curr_core_tx_density = 1.25 * 0.7;
- curr_sckt_co_eff = 1.1359;
- curr_chip_layout_overhead =
- 1.2; // die measurement results based on Niagara 1 and 2
- curr_macro_layout_overhead =
- 1.1; // EDA placement and routing tool rule of thumb
- }
-
- if (tech == 45) { // 45nm technology-node. Corresponds to year 2010 in ITRS
- // ITRS HP device type
- SENSE_AMP_D = .04e-9; // s
- SENSE_AMP_P = 2.7e-15; // J
- vdd[0] = 1.0;
- Lphy[0] = 0.018;
- Lelec[0] = 0.01345;
- t_ox[0] = 0.65e-3;
- v_th[0] = .18035;
- c_ox[0] = 3.77e-14;
- mobility_eff[0] = 266.68 * (1e-2 * 1e6 * 1e-2 * 1e6);
- Vdsat[0] = 9.38E-2;
- c_g_ideal[0] = 6.78e-16;
- c_fringe[0] = 0.05e-15;
- c_junc[0] = 1e-15;
- I_on_n[0] = 2046.6e-6;
- // There are certain problems with the ITRS PMOS numbers in MASTAR for
- // 45nm. So we are using 65nm values of n_to_p_eff_curr_drv_ratio and
- // gmp_to_gmn_multiplier for 45nm
- I_on_p[0] = I_on_n[0] / 2; // This value is fixed arbitrarily but I_on_p
- // is not being used in CACTI
- nmos_effective_resistance_multiplier = 1.51;
- n_to_p_eff_curr_drv_ratio[0] = 2.41;
- gmp_to_gmn_multiplier[0] = 1.38;
- Rnchannelon[0] =
- nmos_effective_resistance_multiplier * vdd[0] / I_on_n[0];
- Rpchannelon[0] = n_to_p_eff_curr_drv_ratio[0] * Rnchannelon[0];
- long_channel_leakage_reduction[0] =
- 1 / 3.546; // Using MASTAR, @380K, increase Lgate until Ion reduces
- // to 90%, Ioff(Lgate normal)/Ioff(Lgate long)= 3.74
- I_off_n[0][0] = 2.8e-7;
- I_off_n[0][10] = 3.28e-7;
- I_off_n[0][20] = 3.81e-7;
- I_off_n[0][30] = 4.39e-7;
- I_off_n[0][40] = 5.02e-7;
- I_off_n[0][50] = 5.69e-7;
- I_off_n[0][60] = 6.42e-7;
- I_off_n[0][70] = 7.2e-7;
- I_off_n[0][80] = 8.03e-7;
- I_off_n[0][90] = 8.91e-7;
- I_off_n[0][100] = 9.84e-7;
-
- I_g_on_n[0][0] = 3.59e-8; // A/micron
- I_g_on_n[0][10] = 3.59e-8;
- I_g_on_n[0][20] = 3.59e-8;
- I_g_on_n[0][30] = 3.59e-8;
- I_g_on_n[0][40] = 3.59e-8;
- I_g_on_n[0][50] = 3.59e-8;
- I_g_on_n[0][60] = 3.59e-8;
- I_g_on_n[0][70] = 3.59e-8;
- I_g_on_n[0][80] = 3.59e-8;
- I_g_on_n[0][90] = 3.59e-8;
- I_g_on_n[0][100] = 3.59e-8;
-
- // ITRS LSTP device type
- vdd[1] = 1.1;
- Lphy[1] = 0.028;
- Lelec[1] = 0.0212;
- t_ox[1] = 1.4e-3;
- v_th[1] = 0.50245;
- c_ox[1] = 2.01e-14;
- mobility_eff[1] = 363.96 * (1e-2 * 1e6 * 1e-2 * 1e6);
- Vdsat[1] = 9.12e-2;
- c_g_ideal[1] = 5.18e-16;
- c_fringe[1] = 0.08e-15;
- c_junc[1] = 1e-15;
- I_on_n[1] = 666.2e-6;
- I_on_p[1] = I_on_n[1] / 2;
- nmos_effective_resistance_multiplier = 1.99;
- n_to_p_eff_curr_drv_ratio[1] = 2.23;
- gmp_to_gmn_multiplier[1] = 0.99;
- Rnchannelon[1] =
- nmos_effective_resistance_multiplier * vdd[1] / I_on_n[1];
- Rpchannelon[1] = n_to_p_eff_curr_drv_ratio[1] * Rnchannelon[1];
- long_channel_leakage_reduction[1] = 1 / 2.08;
- I_off_n[1][0] = 1.01e-11;
- I_off_n[1][10] = 1.65e-11;
- I_off_n[1][20] = 2.62e-11;
- I_off_n[1][30] = 4.06e-11;
- I_off_n[1][40] = 6.12e-11;
- I_off_n[1][50] = 9.02e-11;
- I_off_n[1][60] = 1.3e-10;
- I_off_n[1][70] = 1.83e-10;
- I_off_n[1][80] = 2.51e-10;
- I_off_n[1][90] = 3.29e-10;
- I_off_n[1][100] = 4.1e-10;
-
- I_g_on_n[1][0] = 9.47e-12; // A/micron
- I_g_on_n[1][10] = 9.47e-12;
- I_g_on_n[1][20] = 9.47e-12;
- I_g_on_n[1][30] = 9.47e-12;
- I_g_on_n[1][40] = 9.47e-12;
- I_g_on_n[1][50] = 9.47e-12;
- I_g_on_n[1][60] = 9.47e-12;
- I_g_on_n[1][70] = 9.47e-12;
- I_g_on_n[1][80] = 9.47e-12;
- I_g_on_n[1][90] = 9.47e-12;
- I_g_on_n[1][100] = 9.47e-12;
-
- // ITRS LOP device type
- vdd[2] = 0.7;
- Lphy[2] = 0.022;
- Lelec[2] = 0.016;
- t_ox[2] = 0.9e-3;
- v_th[2] = 0.22599;
- c_ox[2] = 2.82e-14; // F/micron2
- mobility_eff[2] = 508.9 * (1e-2 * 1e6 * 1e-2 * 1e6);
- Vdsat[2] = 5.71e-2;
- c_g_ideal[2] = 6.2e-16;
- c_fringe[2] = 0.073e-15;
- c_junc[2] = 1e-15;
- I_on_n[2] = 748.9e-6;
- I_on_p[2] = I_on_n[2] / 2;
- nmos_effective_resistance_multiplier = 1.76;
- n_to_p_eff_curr_drv_ratio[2] = 2.28;
- gmp_to_gmn_multiplier[2] = 1.11;
- Rnchannelon[2] =
- nmos_effective_resistance_multiplier * vdd[2] / I_on_n[2];
- Rpchannelon[2] = n_to_p_eff_curr_drv_ratio[2] * Rnchannelon[2];
- long_channel_leakage_reduction[2] = 1 / 1.92;
- I_off_n[2][0] = 4.03e-9;
- I_off_n[2][10] = 5.02e-9;
- I_off_n[2][20] = 6.18e-9;
- I_off_n[2][30] = 7.51e-9;
- I_off_n[2][40] = 9.04e-9;
- I_off_n[2][50] = 1.08e-8;
- I_off_n[2][60] = 1.27e-8;
- I_off_n[2][70] = 1.47e-8;
- I_off_n[2][80] = 1.66e-8;
- I_off_n[2][90] = 1.84e-8;
- I_off_n[2][100] = 2.03e-8;
-
- I_g_on_n[2][0] = 3.24e-8; // A/micron
- I_g_on_n[2][10] = 4.01e-8;
- I_g_on_n[2][20] = 4.90e-8;
- I_g_on_n[2][30] = 5.92e-8;
- I_g_on_n[2][40] = 7.08e-8;
- I_g_on_n[2][50] = 8.38e-8;
- I_g_on_n[2][60] = 9.82e-8;
- I_g_on_n[2][70] = 1.14e-7;
- I_g_on_n[2][80] = 1.29e-7;
- I_g_on_n[2][90] = 1.43e-7;
- I_g_on_n[2][100] = 1.54e-7;
-
- if (ram_cell_tech_type == lp_dram) {
- // LP-DRAM cell access transistor technology parameters
- curr_vdd_dram_cell = 1.1;
- Lphy[3] = 0.078;
- Lelec[3] = 0.0504; // Assume Lelec is 30% lesser than Lphy for DRAM
- // access and wordline transistors.
- curr_v_th_dram_access_transistor = 0.44559;
- width_dram_access_transistor = 0.079;
- curr_I_on_dram_cell = 36e-6; // A
- curr_I_off_dram_cell_worst_case_length_temp = 19.5e-12;
- curr_Wmemcella_dram = width_dram_access_transistor;
- curr_Wmemcellpmos_dram = 0;
- curr_Wmemcellnmos_dram = 0;
- curr_area_cell_dram = width_dram_access_transistor * Lphy[3] * 10.0;
- curr_asp_ratio_cell_dram = 1.46;
- curr_c_dram_cell = 20e-15;
-
- // LP-DRAM wordline transistor parameters
- curr_vpp = 1.5;
- t_ox[3] = 2.1e-3;
- v_th[3] = 0.44559;
- c_ox[3] = 1.41e-14;
- mobility_eff[3] = 426.30 * (1e-2 * 1e6 * 1e-2 * 1e6);
- Vdsat[3] = 0.181;
- c_g_ideal[3] = 1.10e-15;
- c_fringe[3] = 0.08e-15;
- c_junc[3] = 1e-15;
- I_on_n[3] = 456e-6;
- I_on_p[3] = I_on_n[3] / 2;
- nmos_effective_resistance_multiplier = 1.65;
- n_to_p_eff_curr_drv_ratio[3] = 2.05;
- gmp_to_gmn_multiplier[3] = 0.90;
- Rnchannelon[3] =
- nmos_effective_resistance_multiplier * curr_vpp / I_on_n[3];
- Rpchannelon[3] = n_to_p_eff_curr_drv_ratio[3] * Rnchannelon[3];
- long_channel_leakage_reduction[3] = 1;
- I_off_n[3][0] = 2.54e-11;
- I_off_n[3][10] = 3.94e-11;
- I_off_n[3][20] = 5.95e-11;
- I_off_n[3][30] = 8.79e-11;
- I_off_n[3][40] = 1.27e-10;
- I_off_n[3][50] = 1.79e-10;
- I_off_n[3][60] = 2.47e-10;
- I_off_n[3][70] = 3.31e-10;
- I_off_n[3][80] = 4.26e-10;
- I_off_n[3][90] = 5.27e-10;
- I_off_n[3][100] = 6.46e-10;
- } else if (ram_cell_tech_type == comm_dram) {
- // COMM-DRAM cell access transistor technology parameters
- curr_vdd_dram_cell = 1.1;
- Lphy[3] = 0.045;
- Lelec[3] = 0.0298;
- curr_v_th_dram_access_transistor = 1;
- width_dram_access_transistor = 0.045;
- curr_I_on_dram_cell = 20e-6; // A
- curr_I_off_dram_cell_worst_case_length_temp = 1e-15;
- curr_Wmemcella_dram = width_dram_access_transistor;
- curr_Wmemcellpmos_dram = 0;
- curr_Wmemcellnmos_dram = 0;
- curr_area_cell_dram = 6 * 0.045 * 0.045;
- curr_asp_ratio_cell_dram = 1.5;
- curr_c_dram_cell = 30e-15;
-
- // COMM-DRAM wordline transistor parameters
- curr_vpp = 2.7;
- t_ox[3] = 4e-3;
- v_th[3] = 1.0;
- c_ox[3] = 7.98e-15;
- mobility_eff[3] = 368.58 * (1e-2 * 1e6 * 1e-2 * 1e6);
- Vdsat[3] = 0.147;
- c_g_ideal[3] = 3.59e-16;
- c_fringe[3] = 0.08e-15;
- c_junc[3] = 1e-15;
- I_on_n[3] = 999.4e-6;
- I_on_p[3] = I_on_n[3] / 2;
- nmos_effective_resistance_multiplier = 1.69;
- n_to_p_eff_curr_drv_ratio[3] = 1.95;
- gmp_to_gmn_multiplier[3] = 0.90;
- Rnchannelon[3] =
- nmos_effective_resistance_multiplier * curr_vpp / I_on_n[3];
- Rpchannelon[3] = n_to_p_eff_curr_drv_ratio[3] * Rnchannelon[3];
- long_channel_leakage_reduction[3] = 1;
- I_off_n[3][0] = 1.31e-14;
- I_off_n[3][10] = 2.68e-14;
- I_off_n[3][20] = 5.25e-14;
- I_off_n[3][30] = 9.88e-14;
- I_off_n[3][40] = 1.79e-13;
- I_off_n[3][50] = 3.15e-13;
- I_off_n[3][60] = 5.36e-13;
- I_off_n[3][70] = 8.86e-13;
- I_off_n[3][80] = 1.42e-12;
- I_off_n[3][90] = 2.20e-12;
- I_off_n[3][100] = 3.29e-12;
- }
-
- // SRAM cell properties
- curr_Wmemcella_sram = 1.31 * g_ip->F_sz_um;
- curr_Wmemcellpmos_sram = 1.23 * g_ip->F_sz_um;
- curr_Wmemcellnmos_sram = 2.08 * g_ip->F_sz_um;
- curr_area_cell_sram = 146 * g_ip->F_sz_um * g_ip->F_sz_um;
- curr_asp_ratio_cell_sram = 1.46;
- // CAM cell properties //TODO: data need to be revisited
- curr_Wmemcella_cam = 1.31 * g_ip->F_sz_um;
- curr_Wmemcellpmos_cam = 1.23 * g_ip->F_sz_um;
- curr_Wmemcellnmos_cam = 2.08 * g_ip->F_sz_um;
- curr_area_cell_cam = 292 * g_ip->F_sz_um * g_ip->F_sz_um;
- curr_asp_ratio_cell_cam = 2.92;
- // Empirical undifferetiated core/FU coefficient
- curr_logic_scaling_co_eff = 0.7 * 0.7;
- curr_core_tx_density = 1.25;
- curr_sckt_co_eff = 1.1387;
- curr_chip_layout_overhead =
- 1.2; // die measurement results based on Niagara 1 and 2
- curr_macro_layout_overhead =
- 1.1; // EDA placement and routing tool rule of thumb
- }
-
- if (tech == 32) {
- SENSE_AMP_D = .03e-9; // s
- SENSE_AMP_P = 2.16e-15; // J
- // For 2013, MPU/ASIC stagger-contacted M1 half-pitch is 32 nm (so this is
- // 32 nm technology i.e. FEATURESIZE = 0.032). Using the SOI process
- // numbers for HP and LSTP.
- vdd[0] = 0.9;
- Lphy[0] = 0.013;
- Lelec[0] = 0.01013;
- t_ox[0] = 0.5e-3;
- v_th[0] = 0.21835;
- c_ox[0] = 4.11e-14;
- mobility_eff[0] = 361.84 * (1e-2 * 1e6 * 1e-2 * 1e6);
- Vdsat[0] = 5.09E-2;
- c_g_ideal[0] = 5.34e-16;
- c_fringe[0] = 0.04e-15;
- c_junc[0] = 1e-15;
- I_on_n[0] = 2211.7e-6;
- I_on_p[0] = I_on_n[0] / 2;
- nmos_effective_resistance_multiplier = 1.49;
- n_to_p_eff_curr_drv_ratio[0] = 2.41;
- gmp_to_gmn_multiplier[0] = 1.38;
- Rnchannelon[0] = nmos_effective_resistance_multiplier * vdd[0] /
- I_on_n[0]; // ohm-micron
- Rpchannelon[0] =
- n_to_p_eff_curr_drv_ratio[0] * Rnchannelon[0]; // ohm-micron
- long_channel_leakage_reduction[0] = 1 / 3.706;
- // Using MASTAR, @300K (380K does not work in MASTAR), increase Lgate
- // until Ion reduces to 95% or Lgate increase by 5% (DG device can only
- // increase by 5%), whichever comes first
- I_off_n[0][0] = 1.52e-7;
- I_off_n[0][10] = 1.55e-7;
- I_off_n[0][20] = 1.59e-7;
- I_off_n[0][30] = 1.68e-7;
- I_off_n[0][40] = 1.90e-7;
- I_off_n[0][50] = 2.69e-7;
- I_off_n[0][60] = 5.32e-7;
- I_off_n[0][70] = 1.02e-6;
- I_off_n[0][80] = 1.62e-6;
- I_off_n[0][90] = 2.73e-6;
- I_off_n[0][100] = 6.1e-6;
-
- I_g_on_n[0][0] = 6.55e-8; // A/micron
- I_g_on_n[0][10] = 6.55e-8;
- I_g_on_n[0][20] = 6.55e-8;
- I_g_on_n[0][30] = 6.55e-8;
- I_g_on_n[0][40] = 6.55e-8;
- I_g_on_n[0][50] = 6.55e-8;
- I_g_on_n[0][60] = 6.55e-8;
- I_g_on_n[0][70] = 6.55e-8;
- I_g_on_n[0][80] = 6.55e-8;
- I_g_on_n[0][90] = 6.55e-8;
- I_g_on_n[0][100] = 6.55e-8;
-
- // 32 DG
- // I_g_on_n[0][0] = 2.71e-9;//A/micron
- // I_g_on_n[0][10] = 2.71e-9;
- // I_g_on_n[0][20] = 2.71e-9;
- // I_g_on_n[0][30] = 2.71e-9;
- // I_g_on_n[0][40] = 2.71e-9;
- // I_g_on_n[0][50] = 2.71e-9;
- // I_g_on_n[0][60] = 2.71e-9;
- // I_g_on_n[0][70] = 2.71e-9;
- // I_g_on_n[0][80] = 2.71e-9;
- // I_g_on_n[0][90] = 2.71e-9;
- // I_g_on_n[0][100] = 2.71e-9;
-
- // LSTP device type
- vdd[1] = 1;
- Lphy[1] = 0.020;
- Lelec[1] = 0.0173;
- t_ox[1] = 1.2e-3;
- v_th[1] = 0.513;
- c_ox[1] = 2.29e-14;
- mobility_eff[1] = 347.46 * (1e-2 * 1e6 * 1e-2 * 1e6);
- Vdsat[1] = 8.64e-2;
- c_g_ideal[1] = 4.58e-16;
- c_fringe[1] = 0.053e-15;
- c_junc[1] = 1e-15;
- I_on_n[1] = 683.6e-6;
- I_on_p[1] = I_on_n[1] / 2;
- nmos_effective_resistance_multiplier = 1.99;
- n_to_p_eff_curr_drv_ratio[1] = 2.23;
- gmp_to_gmn_multiplier[1] = 0.99;
- Rnchannelon[1] =
- nmos_effective_resistance_multiplier * vdd[1] / I_on_n[1];
- Rpchannelon[1] = n_to_p_eff_curr_drv_ratio[1] * Rnchannelon[1];
- long_channel_leakage_reduction[1] = 1 / 1.93;
- I_off_n[1][0] = 2.06e-11;
- I_off_n[1][10] = 3.30e-11;
- I_off_n[1][20] = 5.15e-11;
- I_off_n[1][30] = 7.83e-11;
- I_off_n[1][40] = 1.16e-10;
- I_off_n[1][50] = 1.69e-10;
- I_off_n[1][60] = 2.40e-10;
- I_off_n[1][70] = 3.34e-10;
- I_off_n[1][80] = 4.54e-10;
- I_off_n[1][90] = 5.96e-10;
- I_off_n[1][100] = 7.44e-10;
-
- I_g_on_n[1][0] = 3.73e-11; // A/micron
- I_g_on_n[1][10] = 3.73e-11;
- I_g_on_n[1][20] = 3.73e-11;
- I_g_on_n[1][30] = 3.73e-11;
- I_g_on_n[1][40] = 3.73e-11;
- I_g_on_n[1][50] = 3.73e-11;
- I_g_on_n[1][60] = 3.73e-11;
- I_g_on_n[1][70] = 3.73e-11;
- I_g_on_n[1][80] = 3.73e-11;
- I_g_on_n[1][90] = 3.73e-11;
- I_g_on_n[1][100] = 3.73e-11;
-
- // LOP device type
- vdd[2] = 0.6;
- Lphy[2] = 0.016;
- Lelec[2] = 0.01232;
- t_ox[2] = 0.9e-3;
- v_th[2] = 0.24227;
- c_ox[2] = 2.84e-14;
- mobility_eff[2] = 513.52 * (1e-2 * 1e6 * 1e-2 * 1e6);
- Vdsat[2] = 4.64e-2;
- c_g_ideal[2] = 4.54e-16;
- c_fringe[2] = 0.057e-15;
- c_junc[2] = 1e-15;
- I_on_n[2] = 827.8e-6;
- I_on_p[2] = I_on_n[2] / 2;
- nmos_effective_resistance_multiplier = 1.73;
- n_to_p_eff_curr_drv_ratio[2] = 2.28;
- gmp_to_gmn_multiplier[2] = 1.11;
- Rnchannelon[2] =
- nmos_effective_resistance_multiplier * vdd[2] / I_on_n[2];
- Rpchannelon[2] = n_to_p_eff_curr_drv_ratio[2] * Rnchannelon[2];
- long_channel_leakage_reduction[2] = 1 / 1.89;
- I_off_n[2][0] = 5.94e-8;
- I_off_n[2][10] = 7.23e-8;
- I_off_n[2][20] = 8.7e-8;
- I_off_n[2][30] = 1.04e-7;
- I_off_n[2][40] = 1.22e-7;
- I_off_n[2][50] = 1.43e-7;
- I_off_n[2][60] = 1.65e-7;
- I_off_n[2][70] = 1.90e-7;
- I_off_n[2][80] = 2.15e-7;
- I_off_n[2][90] = 2.39e-7;
- I_off_n[2][100] = 2.63e-7;
-
- I_g_on_n[2][0] = 2.93e-9; // A/micron
- I_g_on_n[2][10] = 2.93e-9;
- I_g_on_n[2][20] = 2.93e-9;
- I_g_on_n[2][30] = 2.93e-9;
- I_g_on_n[2][40] = 2.93e-9;
- I_g_on_n[2][50] = 2.93e-9;
- I_g_on_n[2][60] = 2.93e-9;
- I_g_on_n[2][70] = 2.93e-9;
- I_g_on_n[2][80] = 2.93e-9;
- I_g_on_n[2][90] = 2.93e-9;
- I_g_on_n[2][100] = 2.93e-9;
-
- if (ram_cell_tech_type == lp_dram) {
- // LP-DRAM cell access transistor technology parameters
- curr_vdd_dram_cell = 1.0;
- Lphy[3] = 0.056;
- Lelec[3] = 0.0419; // Assume Lelec is 30% lesser than Lphy for DRAM
- // access and wordline transistors.
- curr_v_th_dram_access_transistor = 0.44129;
- width_dram_access_transistor = 0.056;
- curr_I_on_dram_cell = 36e-6;
- curr_I_off_dram_cell_worst_case_length_temp = 18.9e-12;
- curr_Wmemcella_dram = width_dram_access_transistor;
- curr_Wmemcellpmos_dram = 0;
- curr_Wmemcellnmos_dram = 0;
- curr_area_cell_dram = width_dram_access_transistor * Lphy[3] * 10.0;
- curr_asp_ratio_cell_dram = 1.46;
- curr_c_dram_cell = 20e-15;
-
- // LP-DRAM wordline transistor parameters
- curr_vpp = 1.5;
- t_ox[3] = 2e-3;
- v_th[3] = 0.44467;
- c_ox[3] = 1.48e-14;
- mobility_eff[3] = 408.12 * (1e-2 * 1e6 * 1e-2 * 1e6);
- Vdsat[3] = 0.174;
- c_g_ideal[3] = 7.45e-16;
- c_fringe[3] = 0.053e-15;
- c_junc[3] = 1e-15;
- I_on_n[3] = 1055.4e-6;
- I_on_p[3] = I_on_n[3] / 2;
- nmos_effective_resistance_multiplier = 1.65;
- n_to_p_eff_curr_drv_ratio[3] = 2.05;
- gmp_to_gmn_multiplier[3] = 0.90;
- Rnchannelon[3] =
- nmos_effective_resistance_multiplier * curr_vpp / I_on_n[3];
- Rpchannelon[3] = n_to_p_eff_curr_drv_ratio[3] * Rnchannelon[3];
- long_channel_leakage_reduction[3] = 1;
- I_off_n[3][0] = 3.57e-11;
- I_off_n[3][10] = 5.51e-11;
- I_off_n[3][20] = 8.27e-11;
- I_off_n[3][30] = 1.21e-10;
- I_off_n[3][40] = 1.74e-10;
- I_off_n[3][50] = 2.45e-10;
- I_off_n[3][60] = 3.38e-10;
- I_off_n[3][70] = 4.53e-10;
- I_off_n[3][80] = 5.87e-10;
- I_off_n[3][90] = 7.29e-10;
- I_off_n[3][100] = 8.87e-10;
- } else if (ram_cell_tech_type == comm_dram) {
- // COMM-DRAM cell access transistor technology parameters
- curr_vdd_dram_cell = 1.0;
- Lphy[3] = 0.032;
- Lelec[3] = 0.0205; // Assume Lelec is 30% lesser than Lphy for DRAM
- // access and wordline transistors.
- curr_v_th_dram_access_transistor = 1;
- width_dram_access_transistor = 0.032;
- curr_I_on_dram_cell = 20e-6;
- curr_I_off_dram_cell_worst_case_length_temp = 1e-15;
- curr_Wmemcella_dram = width_dram_access_transistor;
- curr_Wmemcellpmos_dram = 0;
- curr_Wmemcellnmos_dram = 0;
- curr_area_cell_dram = 6 * 0.032 * 0.032;
- curr_asp_ratio_cell_dram = 1.5;
- curr_c_dram_cell = 30e-15;
-
- // COMM-DRAM wordline transistor parameters
- curr_vpp = 2.6;
- t_ox[3] = 4e-3;
- v_th[3] = 1.0;
- c_ox[3] = 7.99e-15;
- mobility_eff[3] = 380.76 * (1e-2 * 1e6 * 1e-2 * 1e6);
- Vdsat[3] = 0.129;
- c_g_ideal[3] = 2.56e-16;
- c_fringe[3] = 0.053e-15;
- c_junc[3] = 1e-15;
- I_on_n[3] = 1024.5e-6;
- I_on_p[3] = I_on_n[3] / 2;
- nmos_effective_resistance_multiplier = 1.69;
- n_to_p_eff_curr_drv_ratio[3] = 1.95;
- gmp_to_gmn_multiplier[3] = 0.90;
- Rnchannelon[3] =
- nmos_effective_resistance_multiplier * curr_vpp / I_on_n[3];
- Rpchannelon[3] = n_to_p_eff_curr_drv_ratio[3] * Rnchannelon[3];
- long_channel_leakage_reduction[3] = 1;
- I_off_n[3][0] = 3.63e-14;
- I_off_n[3][10] = 7.18e-14;
- I_off_n[3][20] = 1.36e-13;
- I_off_n[3][30] = 2.49e-13;
- I_off_n[3][40] = 4.41e-13;
- I_off_n[3][50] = 7.55e-13;
- I_off_n[3][60] = 1.26e-12;
- I_off_n[3][70] = 2.03e-12;
- I_off_n[3][80] = 3.19e-12;
- I_off_n[3][90] = 4.87e-12;
- I_off_n[3][100] = 7.16e-12;
- }
-
- // SRAM cell properties
- curr_Wmemcella_sram = 1.31 * g_ip->F_sz_um;
- curr_Wmemcellpmos_sram = 1.23 * g_ip->F_sz_um;
- curr_Wmemcellnmos_sram = 2.08 * g_ip->F_sz_um;
- curr_area_cell_sram = 146 * g_ip->F_sz_um * g_ip->F_sz_um;
- curr_asp_ratio_cell_sram = 1.46;
- // CAM cell properties //TODO: data need to be revisited
- curr_Wmemcella_cam = 1.31 * g_ip->F_sz_um;
- curr_Wmemcellpmos_cam = 1.23 * g_ip->F_sz_um;
- curr_Wmemcellnmos_cam = 2.08 * g_ip->F_sz_um;
- curr_area_cell_cam = 292 * g_ip->F_sz_um * g_ip->F_sz_um;
- curr_asp_ratio_cell_cam = 2.92;
- // Empirical undifferetiated core/FU coefficient
- curr_logic_scaling_co_eff = 0.7 * 0.7 * 0.7;
- curr_core_tx_density = 1.25 / 0.7;
- curr_sckt_co_eff = 1.1111;
- curr_chip_layout_overhead =
- 1.2; // die measurement results based on Niagara 1 and 2
- curr_macro_layout_overhead =
- 1.1; // EDA placement and routing tool rule of thumb
- }
-
- if (tech == 22) {
- // For 2016, MPU/ASIC stagger-contacted M1 half-pitch is 22 nm (so this is
- // 22 nm technology i.e. FEATURESIZE = 0.022). Using the DG process
- // numbers for HP. 22 nm HP
- vdd[0] = 0.8;
- Lphy[0] = 0.009; // Lphy is the physical gate-length.
- Lelec[0] = 0.00468; // Lelec is the electrical gate-length.
- t_ox[0] = 0.55e-3; // micron
- v_th[0] = 0.1395; // V
- c_ox[0] = 3.63e-14; // F/micron2
- mobility_eff[0] = 426.07 * (1e-2 * 1e6 * 1e-2 * 1e6); // micron2 / Vs
- Vdsat[0] = 2.33e-2; // V/micron
- c_g_ideal[0] = 3.27e-16; // F/micron
- c_fringe[0] = 0.06e-15; // F/micron
- c_junc[0] = 0; // F/micron2
- I_on_n[0] = 2626.4e-6; // A/micron
- I_on_p[0] = I_on_n[0] /
- 2; // A/micron //This value for I_on_p is not really used.
- nmos_effective_resistance_multiplier = 1.45;
- n_to_p_eff_curr_drv_ratio[0] =
- 2; // Wpmos/Wnmos = 2 in 2007 MASTAR. Look in
- //"Dynamic" tab of Device workspace.
- gmp_to_gmn_multiplier[0] = 1.38; // Just using the 32nm SOI value.
- Rnchannelon[0] = nmos_effective_resistance_multiplier * vdd[0] /
- I_on_n[0]; // ohm-micron
- Rpchannelon[0] =
- n_to_p_eff_curr_drv_ratio[0] * Rnchannelon[0]; // ohm-micron
- long_channel_leakage_reduction[0] = 1 / 3.274;
- I_off_n[0][0] =
- 1.52e-7 / 1.5 *
- 1.2; // From 22nm, leakage current are directly from ITRS report
- // rather than MASTAR, since MASTAR has serious bugs there.
- I_off_n[0][10] = 1.55e-7 / 1.5 * 1.2;
- I_off_n[0][20] = 1.59e-7 / 1.5 * 1.2;
- I_off_n[0][30] = 1.68e-7 / 1.5 * 1.2;
- I_off_n[0][40] = 1.90e-7 / 1.5 * 1.2;
- I_off_n[0][50] = 2.69e-7 / 1.5 * 1.2;
- I_off_n[0][60] = 5.32e-7 / 1.5 * 1.2;
- I_off_n[0][70] = 1.02e-6 / 1.5 * 1.2;
- I_off_n[0][80] = 1.62e-6 / 1.5 * 1.2;
- I_off_n[0][90] = 2.73e-6 / 1.5 * 1.2;
- I_off_n[0][100] = 6.1e-6 / 1.5 * 1.2;
- // for 22nm DG HP
- I_g_on_n[0][0] = 1.81e-9; // A/micron
- I_g_on_n[0][10] = 1.81e-9;
- I_g_on_n[0][20] = 1.81e-9;
- I_g_on_n[0][30] = 1.81e-9;
- I_g_on_n[0][40] = 1.81e-9;
- I_g_on_n[0][50] = 1.81e-9;
- I_g_on_n[0][60] = 1.81e-9;
- I_g_on_n[0][70] = 1.81e-9;
- I_g_on_n[0][80] = 1.81e-9;
- I_g_on_n[0][90] = 1.81e-9;
- I_g_on_n[0][100] = 1.81e-9;
-
- // 22 nm LSTP DG
- vdd[1] = 0.8;
- Lphy[1] = 0.014;
- Lelec[1] = 0.008; // Lelec is the electrical gate-length.
- t_ox[1] = 1.1e-3; // micron
- v_th[1] = 0.40126; // V
- c_ox[1] = 2.30e-14; // F/micron2
- mobility_eff[1] = 738.09 * (1e-2 * 1e6 * 1e-2 * 1e6); // micron2 / Vs
- Vdsat[1] = 6.64e-2; // V/micron
- c_g_ideal[1] = 3.22e-16; // F/micron
- c_fringe[1] = 0.08e-15;
- c_junc[1] = 0; // F/micron2
- I_on_n[1] = 727.6e-6; // A/micron
- I_on_p[1] = I_on_n[1] / 2;
- nmos_effective_resistance_multiplier = 1.99;
- n_to_p_eff_curr_drv_ratio[1] = 2;
- gmp_to_gmn_multiplier[1] = 0.99;
- Rnchannelon[1] = nmos_effective_resistance_multiplier * vdd[1] /
- I_on_n[1]; // ohm-micron
- Rpchannelon[1] =
- n_to_p_eff_curr_drv_ratio[1] * Rnchannelon[1]; // ohm-micron
- long_channel_leakage_reduction[1] = 1 / 1.89;
- I_off_n[1][0] = 2.43e-11;
- I_off_n[1][10] = 4.85e-11;
- I_off_n[1][20] = 9.68e-11;
- I_off_n[1][30] = 1.94e-10;
- I_off_n[1][40] = 3.87e-10;
- I_off_n[1][50] = 7.73e-10;
- I_off_n[1][60] = 3.55e-10;
- I_off_n[1][70] = 3.09e-9;
- I_off_n[1][80] = 6.19e-9;
- I_off_n[1][90] = 1.24e-8;
- I_off_n[1][100] = 2.48e-8;
-
- I_g_on_n[1][0] = 4.51e-10; // A/micron
- I_g_on_n[1][10] = 4.51e-10;
- I_g_on_n[1][20] = 4.51e-10;
- I_g_on_n[1][30] = 4.51e-10;
- I_g_on_n[1][40] = 4.51e-10;
- I_g_on_n[1][50] = 4.51e-10;
- I_g_on_n[1][60] = 4.51e-10;
- I_g_on_n[1][70] = 4.51e-10;
- I_g_on_n[1][80] = 4.51e-10;
- I_g_on_n[1][90] = 4.51e-10;
- I_g_on_n[1][100] = 4.51e-10;
-
- // 22 nm LOP
- vdd[2] = 0.6;
- Lphy[2] = 0.011;
- Lelec[2] = 0.00604; // Lelec is the electrical gate-length.
- t_ox[2] = 0.8e-3; // micron
- v_th[2] = 0.2315; // V
- c_ox[2] = 2.87e-14; // F/micron2
- mobility_eff[2] = 698.37 * (1e-2 * 1e6 * 1e-2 * 1e6); // micron2 / Vs
- Vdsat[2] = 1.81e-2; // V/micron
- c_g_ideal[2] = 3.16e-16; // F/micron
- c_fringe[2] = 0.08e-15;
- c_junc[2] =
- 0; // F/micron2 This is Cj0 not Cjunc in MASTAR results->Dynamic Tab
- I_on_n[2] = 916.1e-6; // A/micron
- I_on_p[2] = I_on_n[2] / 2;
- nmos_effective_resistance_multiplier = 1.73;
- n_to_p_eff_curr_drv_ratio[2] = 2;
- gmp_to_gmn_multiplier[2] = 1.11;
- Rnchannelon[2] = nmos_effective_resistance_multiplier * vdd[2] /
- I_on_n[2]; // ohm-micron
- Rpchannelon[2] =
- n_to_p_eff_curr_drv_ratio[2] * Rnchannelon[2]; // ohm-micron
- long_channel_leakage_reduction[2] = 1 / 2.38;
-
- I_off_n[2][0] = 1.31e-8;
- I_off_n[2][10] = 2.60e-8;
- I_off_n[2][20] = 5.14e-8;
- I_off_n[2][30] = 1.02e-7;
- I_off_n[2][40] = 2.02e-7;
- I_off_n[2][50] = 3.99e-7;
- I_off_n[2][60] = 7.91e-7;
- I_off_n[2][70] = 1.09e-6;
- I_off_n[2][80] = 2.09e-6;
- I_off_n[2][90] = 4.04e-6;
- I_off_n[2][100] = 4.48e-6;
-
- I_g_on_n[2][0] = 2.74e-9; // A/micron
- I_g_on_n[2][10] = 2.74e-9;
- I_g_on_n[2][20] = 2.74e-9;
- I_g_on_n[2][30] = 2.74e-9;
- I_g_on_n[2][40] = 2.74e-9;
- I_g_on_n[2][50] = 2.74e-9;
- I_g_on_n[2][60] = 2.74e-9;
- I_g_on_n[2][70] = 2.74e-9;
- I_g_on_n[2][80] = 2.74e-9;
- I_g_on_n[2][90] = 2.74e-9;
- I_g_on_n[2][100] = 2.74e-9;
-
- if (ram_cell_tech_type == 3) {
- } else if (ram_cell_tech_type == 4) {
- // 22 nm commodity DRAM cell access transistor technology parameters.
- // parameters
- curr_vdd_dram_cell = 0.9; // 0.45;//This value has reduced greatly in
- // 2007 ITRS for all technology nodes. In
- // 2005 ITRS, the value was about twice the value in 2007 ITRS
- Lphy[3] = 0.022; // micron
- Lelec[3] = 0.0181; // micron.
- curr_v_th_dram_access_transistor = 1; // V
- width_dram_access_transistor = 0.022; // micron
- curr_I_on_dram_cell =
- 20e-6; // This is a typical value that I have always
- // kept constant. In reality this could perhaps be lower
- curr_I_off_dram_cell_worst_case_length_temp = 1e-15; // A
- curr_Wmemcella_dram = width_dram_access_transistor;
- curr_Wmemcellpmos_dram = 0;
- curr_Wmemcellnmos_dram = 0;
- curr_area_cell_dram = 6 * 0.022 * 0.022; // micron2.
- curr_asp_ratio_cell_dram = 0.667;
- curr_c_dram_cell = 30e-15; // This is a typical value that I have
- // alwaus
- // kept constant.
-
- // 22 nm commodity DRAM wordline transistor parameters obtained using
- // MASTAR.
- curr_vpp = 2.3; // vpp. V
- t_ox[3] = 3.5e-3; // micron
- v_th[3] = 1.0; // V
- c_ox[3] = 9.06e-15; // F/micron2
- mobility_eff[3] = 367.29 * (1e-2 * 1e6 * 1e-2 * 1e6); // micron2 / Vs
- Vdsat[3] = 0.0972; // V/micron
- c_g_ideal[3] = 1.99e-16; // F/micron
- c_fringe[3] = 0.053e-15; // F/micron
- c_junc[3] = 1e-15; // F/micron2
- I_on_n[3] = 910.5e-6; // A/micron
- I_on_p[3] = I_on_n[3] / 2; // This value for I_on_p is not really used.
- nmos_effective_resistance_multiplier =
- 1.69; // Using the value from 32nm.
- //
- n_to_p_eff_curr_drv_ratio[3] = 1.95; // Using the value from 32nm
- gmp_to_gmn_multiplier[3] = 0.90;
- Rnchannelon[3] = nmos_effective_resistance_multiplier * curr_vpp /
- I_on_n[3]; // ohm-micron
- Rpchannelon[3] =
- n_to_p_eff_curr_drv_ratio[3] * Rnchannelon[3]; // ohm-micron
- long_channel_leakage_reduction[3] = 1;
- I_off_n[3][0] = 1.1e-13; // A/micron
- I_off_n[3][10] = 2.11e-13;
- I_off_n[3][20] = 3.88e-13;
- I_off_n[3][30] = 6.9e-13;
- I_off_n[3][40] = 1.19e-12;
- I_off_n[3][50] = 1.98e-12;
- I_off_n[3][60] = 3.22e-12;
- I_off_n[3][70] = 5.09e-12;
- I_off_n[3][80] = 7.85e-12;
- I_off_n[3][90] = 1.18e-11;
- I_off_n[3][100] = 1.72e-11;
-
- } else {
- // some error handler
- }
-
- // SRAM cell properties
- curr_Wmemcella_sram = 1.31 * g_ip->F_sz_um;
- curr_Wmemcellpmos_sram = 1.23 * g_ip->F_sz_um;
- curr_Wmemcellnmos_sram = 2.08 * g_ip->F_sz_um;
- curr_area_cell_sram = 146 * g_ip->F_sz_um * g_ip->F_sz_um;
- curr_asp_ratio_cell_sram = 1.46;
- // CAM cell properties //TODO: data need to be revisited
- curr_Wmemcella_cam = 1.31 * g_ip->F_sz_um;
- curr_Wmemcellpmos_cam = 1.23 * g_ip->F_sz_um;
- curr_Wmemcellnmos_cam = 2.08 * g_ip->F_sz_um;
- curr_area_cell_cam = 292 * g_ip->F_sz_um * g_ip->F_sz_um;
- curr_asp_ratio_cell_cam = 2.92;
- // Empirical undifferetiated core/FU coefficient
- curr_logic_scaling_co_eff = 0.7 * 0.7 * 0.7 * 0.7;
- curr_core_tx_density = 1.25 / 0.7 / 0.7;
- curr_sckt_co_eff = 1.1296;
- curr_chip_layout_overhead =
- 1.2; // die measurement results based on Niagara 1 and 2
- curr_macro_layout_overhead =
- 1.1; // EDA placement and routing tool rule of thumb
- }
-
- if (tech == 16) {
- // For 2019, MPU/ASIC stagger-contacted M1 half-pitch is 16 nm (so this is
- // 16 nm technology i.e. FEATURESIZE = 0.016). Using the DG process
- // numbers for HP. 16 nm HP
- vdd[0] = 0.7;
- Lphy[0] = 0.006; // Lphy is the physical gate-length.
- Lelec[0] = 0.00315; // Lelec is the electrical gate-length.
- t_ox[0] = 0.5e-3; // micron
- v_th[0] = 0.1489; // V
- c_ox[0] = 3.83e-14; // F/micron2 Cox_elec in MASTAR
- mobility_eff[0] = 476.15 * (1e-2 * 1e6 * 1e-2 * 1e6); // micron2 / Vs
- Vdsat[0] = 1.42e-2; // V/micron calculated in spreadsheet
- c_g_ideal[0] = 2.30e-16; // F/micron
- c_fringe[0] = 0.06e-15; // F/micron MASTAR inputdynamic/3
- c_junc[0] = 0; // F/micron2 MASTAR result dynamic
- I_on_n[0] = 2768.4e-6; // A/micron
- I_on_p[0] = I_on_n[0] /
- 2; // A/micron //This value for I_on_p is not really used.
- nmos_effective_resistance_multiplier =
- 1.48; // nmos_effective_resistance_multiplier is the ratio of Ieff
- // to Idsat where Ieff is the effective NMOS current and Idsat
- // is the saturation current.
- n_to_p_eff_curr_drv_ratio[0] =
- 2; // Wpmos/Wnmos = 2 in 2007 MASTAR. Look in
- //"Dynamic" tab of Device workspace.
- gmp_to_gmn_multiplier[0] = 1.38; // Just using the 32nm SOI value.
- Rnchannelon[0] = nmos_effective_resistance_multiplier * vdd[0] /
- I_on_n[0]; // ohm-micron
- Rpchannelon[0] =
- n_to_p_eff_curr_drv_ratio[0] * Rnchannelon[0]; // ohm-micron
- long_channel_leakage_reduction[0] = 1 / 2.655;
- I_off_n[0][0] = 1.52e-7 / 1.5 * 1.2 * 1.07;
- I_off_n[0][10] = 1.55e-7 / 1.5 * 1.2 * 1.07;
- I_off_n[0][20] = 1.59e-7 / 1.5 * 1.2 * 1.07;
- I_off_n[0][30] = 1.68e-7 / 1.5 * 1.2 * 1.07;
- I_off_n[0][40] = 1.90e-7 / 1.5 * 1.2 * 1.07;
- I_off_n[0][50] = 2.69e-7 / 1.5 * 1.2 * 1.07;
- I_off_n[0][60] = 5.32e-7 / 1.5 * 1.2 * 1.07;
- I_off_n[0][70] = 1.02e-6 / 1.5 * 1.2 * 1.07;
- I_off_n[0][80] = 1.62e-6 / 1.5 * 1.2 * 1.07;
- I_off_n[0][90] = 2.73e-6 / 1.5 * 1.2 * 1.07;
- I_off_n[0][100] = 6.1e-6 / 1.5 * 1.2 * 1.07;
- // for 16nm DG HP
- I_g_on_n[0][0] = 1.07e-9; // A/micron
- I_g_on_n[0][10] = 1.07e-9;
- I_g_on_n[0][20] = 1.07e-9;
- I_g_on_n[0][30] = 1.07e-9;
- I_g_on_n[0][40] = 1.07e-9;
- I_g_on_n[0][50] = 1.07e-9;
- I_g_on_n[0][60] = 1.07e-9;
- I_g_on_n[0][70] = 1.07e-9;
- I_g_on_n[0][80] = 1.07e-9;
- I_g_on_n[0][90] = 1.07e-9;
- I_g_on_n[0][100] = 1.07e-9;
-
- // //16 nm LSTP DG
- // vdd[1] = 0.8;
- // Lphy[1] = 0.014;
- // Lelec[1] = 0.008;//Lelec is the electrical gate-length.
- // t_ox[1] = 1.1e-3;//micron
- // v_th[1] = 0.40126;//V
- // c_ox[1] = 2.30e-14;//F/micron2
- // mobility_eff[1] = 738.09 * (1e-2 * 1e6 * 1e-2 * 1e6); //micron2
- // / Vs Vdsat[1] = 6.64e-2; //V/micron c_g_ideal[1]
- // = 3.22e-16;//F/micron c_fringe[1] = 0.008e-15; c_junc[1]
- // =
- // 0;//F/micron2 I_on_n[1] = 727.6e-6;//A/micron I_on_p[1] =
- // I_on_n[1] / 2; nmos_effective_resistance_multiplier = 1.99;
- // n_to_p_eff_curr_drv_ratio[1] = 2;
- // gmp_to_gmn_multiplier[1] = 0.99;
- // Rnchannelon[1] = nmos_effective_resistance_multiplier * vdd[1] /
- // I_on_n[1];//ohm-micron Rpchannelon[1] =
- // n_to_p_eff_curr_drv_ratio[1]
- // * Rnchannelon[1];//ohm-micron I_off_n[1][0] = 2.43e-11;
- // I_off_n[1][10] = 4.85e-11;
- // I_off_n[1][20] = 9.68e-11;
- // I_off_n[1][30] = 1.94e-10;
- // I_off_n[1][40] = 3.87e-10;
- // I_off_n[1][50] = 7.73e-10;
- // I_off_n[1][60] = 3.55e-10;
- // I_off_n[1][70] = 3.09e-9;
- // I_off_n[1][80] = 6.19e-9;
- // I_off_n[1][90] = 1.24e-8;
- // I_off_n[1][100]= 2.48e-8;
- //
- // // for 22nm LSTP HP
- // I_g_on_n[1][0] = 4.51e-10;//A/micron
- // I_g_on_n[1][10] = 4.51e-10;
- // I_g_on_n[1][20] = 4.51e-10;
- // I_g_on_n[1][30] = 4.51e-10;
- // I_g_on_n[1][40] = 4.51e-10;
- // I_g_on_n[1][50] = 4.51e-10;
- // I_g_on_n[1][60] = 4.51e-10;
- // I_g_on_n[1][70] = 4.51e-10;
- // I_g_on_n[1][80] = 4.51e-10;
- // I_g_on_n[1][90] = 4.51e-10;
- // I_g_on_n[1][100] = 4.51e-10;
-
- if (ram_cell_tech_type == 3) {
- } else if (ram_cell_tech_type == 4) {
- // 22 nm commodity DRAM cell access transistor technology parameters.
- // parameters
- curr_vdd_dram_cell = 0.9; // 0.45;//This value has reduced greatly in
- // 2007 ITRS for all technology nodes. In
- // 2005 ITRS, the value was about twice the value in 2007 ITRS
- Lphy[3] = 0.022; // micron
- Lelec[3] = 0.0181; // micron.
- curr_v_th_dram_access_transistor = 1; // V
- width_dram_access_transistor = 0.022; // micron
- curr_I_on_dram_cell =
- 20e-6; // This is a typical value that I have always
- // kept constant. In reality this could perhaps be lower
- curr_I_off_dram_cell_worst_case_length_temp = 1e-15; // A
- curr_Wmemcella_dram = width_dram_access_transistor;
- curr_Wmemcellpmos_dram = 0;
- curr_Wmemcellnmos_dram = 0;
- curr_area_cell_dram = 6 * 0.022 * 0.022; // micron2.
- curr_asp_ratio_cell_dram = 0.667;
- curr_c_dram_cell = 30e-15; // This is a typical value that I have
- // alwaus
- // kept constant.
-
- // 22 nm commodity DRAM wordline transistor parameters obtained using
- // MASTAR.
- curr_vpp = 2.3; // vpp. V
- t_ox[3] = 3.5e-3; // micron
- v_th[3] = 1.0; // V
- c_ox[3] = 9.06e-15; // F/micron2
- mobility_eff[3] = 367.29 * (1e-2 * 1e6 * 1e-2 * 1e6); // micron2 / Vs
- Vdsat[3] = 0.0972; // V/micron
- c_g_ideal[3] = 1.99e-16; // F/micron
- c_fringe[3] = 0.053e-15; // F/micron
- c_junc[3] = 1e-15; // F/micron2
- I_on_n[3] = 910.5e-6; // A/micron
- I_on_p[3] = I_on_n[3] / 2; // This value for I_on_p is not really used.
- nmos_effective_resistance_multiplier =
- 1.69; // Using the value from 32nm.
- //
- n_to_p_eff_curr_drv_ratio[3] = 1.95; // Using the value from 32nm
- gmp_to_gmn_multiplier[3] = 0.90;
- Rnchannelon[3] = nmos_effective_resistance_multiplier * curr_vpp /
- I_on_n[3]; // ohm-micron
- Rpchannelon[3] =
- n_to_p_eff_curr_drv_ratio[3] * Rnchannelon[3]; // ohm-micron
- long_channel_leakage_reduction[3] = 1;
- I_off_n[3][0] = 1.1e-13; // A/micron
- I_off_n[3][10] = 2.11e-13;
- I_off_n[3][20] = 3.88e-13;
- I_off_n[3][30] = 6.9e-13;
- I_off_n[3][40] = 1.19e-12;
- I_off_n[3][50] = 1.98e-12;
- I_off_n[3][60] = 3.22e-12;
- I_off_n[3][70] = 5.09e-12;
- I_off_n[3][80] = 7.85e-12;
- I_off_n[3][90] = 1.18e-11;
- I_off_n[3][100] = 1.72e-11;
-
- } else {
- // some error handler
- }
-
- // SRAM cell properties
- curr_Wmemcella_sram = 1.31 * g_ip->F_sz_um;
- curr_Wmemcellpmos_sram = 1.23 * g_ip->F_sz_um;
- curr_Wmemcellnmos_sram = 2.08 * g_ip->F_sz_um;
- curr_area_cell_sram = 146 * g_ip->F_sz_um * g_ip->F_sz_um;
- curr_asp_ratio_cell_sram = 1.46;
- // CAM cell properties //TODO: data need to be revisited
- curr_Wmemcella_cam = 1.31 * g_ip->F_sz_um;
- curr_Wmemcellpmos_cam = 1.23 * g_ip->F_sz_um;
- curr_Wmemcellnmos_cam = 2.08 * g_ip->F_sz_um;
- curr_area_cell_cam = 292 * g_ip->F_sz_um * g_ip->F_sz_um;
- curr_asp_ratio_cell_cam = 2.92;
- // Empirical undifferetiated core/FU coefficient
- curr_logic_scaling_co_eff = 0.7 * 0.7 * 0.7 * 0.7 * 0.7;
- curr_core_tx_density = 1.25 / 0.7 / 0.7 / 0.7;
- curr_sckt_co_eff = 1.1296;
- curr_chip_layout_overhead =
- 1.2; // die measurement results based on Niagara 1 and 2
- curr_macro_layout_overhead =
- 1.1; // EDA placement and routing tool rule of thumb
- }
-
- g_tp.peri_global.Vdd += curr_alpha * vdd[peri_global_tech_type];
- g_tp.peri_global.t_ox += curr_alpha * t_ox[peri_global_tech_type];
- g_tp.peri_global.Vth += curr_alpha * v_th[peri_global_tech_type];
- g_tp.peri_global.C_ox += curr_alpha * c_ox[peri_global_tech_type];
- g_tp.peri_global.C_g_ideal += curr_alpha * c_g_ideal[peri_global_tech_type];
- g_tp.peri_global.C_fringe += curr_alpha * c_fringe[peri_global_tech_type];
- g_tp.peri_global.C_junc += curr_alpha * c_junc[peri_global_tech_type];
- g_tp.peri_global.C_junc_sidewall = 0.25e-15; // F/micron
- g_tp.peri_global.l_phy += curr_alpha * Lphy[peri_global_tech_type];
- g_tp.peri_global.l_elec += curr_alpha * Lelec[peri_global_tech_type];
- g_tp.peri_global.I_on_n += curr_alpha * I_on_n[peri_global_tech_type];
- g_tp.peri_global.R_nch_on +=
- curr_alpha * Rnchannelon[peri_global_tech_type];
- g_tp.peri_global.R_pch_on +=
- curr_alpha * Rpchannelon[peri_global_tech_type];
- g_tp.peri_global.n_to_p_eff_curr_drv_ratio +=
- curr_alpha * n_to_p_eff_curr_drv_ratio[peri_global_tech_type];
- g_tp.peri_global.long_channel_leakage_reduction +=
- curr_alpha * long_channel_leakage_reduction[peri_global_tech_type];
- g_tp.peri_global.I_off_n +=
- curr_alpha * I_off_n[peri_global_tech_type][g_ip->temp - 300];
- g_tp.peri_global.I_off_p +=
- curr_alpha * I_off_n[peri_global_tech_type][g_ip->temp - 300];
- g_tp.peri_global.I_g_on_n +=
- curr_alpha * I_g_on_n[peri_global_tech_type][g_ip->temp - 300];
- g_tp.peri_global.I_g_on_p +=
- curr_alpha * I_g_on_n[peri_global_tech_type][g_ip->temp - 300];
- gmp_to_gmn_multiplier_periph_global +=
- curr_alpha * gmp_to_gmn_multiplier[peri_global_tech_type];
-
- g_tp.sram_cell.Vdd += curr_alpha * vdd[ram_cell_tech_type];
- g_tp.sram_cell.l_phy += curr_alpha * Lphy[ram_cell_tech_type];
- g_tp.sram_cell.l_elec += curr_alpha * Lelec[ram_cell_tech_type];
- g_tp.sram_cell.t_ox += curr_alpha * t_ox[ram_cell_tech_type];
- g_tp.sram_cell.Vth += curr_alpha * v_th[ram_cell_tech_type];
- g_tp.sram_cell.C_g_ideal += curr_alpha * c_g_ideal[ram_cell_tech_type];
- g_tp.sram_cell.C_fringe += curr_alpha * c_fringe[ram_cell_tech_type];
- g_tp.sram_cell.C_junc += curr_alpha * c_junc[ram_cell_tech_type];
- g_tp.sram_cell.C_junc_sidewall = 0.25e-15; // F/micron
- g_tp.sram_cell.I_on_n += curr_alpha * I_on_n[ram_cell_tech_type];
- g_tp.sram_cell.R_nch_on += curr_alpha * Rnchannelon[ram_cell_tech_type];
- g_tp.sram_cell.R_pch_on += curr_alpha * Rpchannelon[ram_cell_tech_type];
- g_tp.sram_cell.n_to_p_eff_curr_drv_ratio +=
- curr_alpha * n_to_p_eff_curr_drv_ratio[ram_cell_tech_type];
- g_tp.sram_cell.long_channel_leakage_reduction +=
- curr_alpha * long_channel_leakage_reduction[ram_cell_tech_type];
- g_tp.sram_cell.I_off_n +=
- curr_alpha * I_off_n[ram_cell_tech_type][g_ip->temp - 300];
- g_tp.sram_cell.I_off_p +=
- curr_alpha * I_off_n[ram_cell_tech_type][g_ip->temp - 300];
- g_tp.sram_cell.I_g_on_n +=
- curr_alpha * I_g_on_n[ram_cell_tech_type][g_ip->temp - 300];
- g_tp.sram_cell.I_g_on_p +=
- curr_alpha * I_g_on_n[ram_cell_tech_type][g_ip->temp - 300];
-
- g_tp.dram_cell_Vdd += curr_alpha * curr_vdd_dram_cell;
- g_tp.dram_acc.Vth += curr_alpha * curr_v_th_dram_access_transistor;
- g_tp.dram_acc.l_phy += curr_alpha * Lphy[dram_cell_tech_flavor];
- g_tp.dram_acc.l_elec += curr_alpha * Lelec[dram_cell_tech_flavor];
- g_tp.dram_acc.C_g_ideal += curr_alpha * c_g_ideal[dram_cell_tech_flavor];
- g_tp.dram_acc.C_fringe += curr_alpha * c_fringe[dram_cell_tech_flavor];
- g_tp.dram_acc.C_junc += curr_alpha * c_junc[dram_cell_tech_flavor];
- g_tp.dram_acc.C_junc_sidewall = 0.25e-15; // F/micron
- g_tp.dram_cell_I_on += curr_alpha * curr_I_on_dram_cell;
- g_tp.dram_cell_I_off_worst_case_len_temp +=
- curr_alpha * curr_I_off_dram_cell_worst_case_length_temp;
- g_tp.dram_acc.I_on_n += curr_alpha * I_on_n[dram_cell_tech_flavor];
- g_tp.dram_cell_C += curr_alpha * curr_c_dram_cell;
- g_tp.vpp += curr_alpha * curr_vpp;
- g_tp.dram_wl.l_phy += curr_alpha * Lphy[dram_cell_tech_flavor];
- g_tp.dram_wl.l_elec += curr_alpha * Lelec[dram_cell_tech_flavor];
- g_tp.dram_wl.C_g_ideal += curr_alpha * c_g_ideal[dram_cell_tech_flavor];
- g_tp.dram_wl.C_fringe += curr_alpha * c_fringe[dram_cell_tech_flavor];
- g_tp.dram_wl.C_junc += curr_alpha * c_junc[dram_cell_tech_flavor];
- g_tp.dram_wl.C_junc_sidewall = 0.25e-15; // F/micron
- g_tp.dram_wl.I_on_n += curr_alpha * I_on_n[dram_cell_tech_flavor];
- g_tp.dram_wl.R_nch_on += curr_alpha * Rnchannelon[dram_cell_tech_flavor];
- g_tp.dram_wl.R_pch_on += curr_alpha * Rpchannelon[dram_cell_tech_flavor];
- g_tp.dram_wl.n_to_p_eff_curr_drv_ratio +=
- curr_alpha * n_to_p_eff_curr_drv_ratio[dram_cell_tech_flavor];
- g_tp.dram_wl.long_channel_leakage_reduction +=
- curr_alpha * long_channel_leakage_reduction[dram_cell_tech_flavor];
- g_tp.dram_wl.I_off_n +=
- curr_alpha * I_off_n[dram_cell_tech_flavor][g_ip->temp - 300];
- g_tp.dram_wl.I_off_p +=
- curr_alpha * I_off_n[dram_cell_tech_flavor][g_ip->temp - 300];
-
- g_tp.cam_cell.Vdd += curr_alpha * vdd[ram_cell_tech_type];
- g_tp.cam_cell.l_phy += curr_alpha * Lphy[ram_cell_tech_type];
- g_tp.cam_cell.l_elec += curr_alpha * Lelec[ram_cell_tech_type];
- g_tp.cam_cell.t_ox += curr_alpha * t_ox[ram_cell_tech_type];
- g_tp.cam_cell.Vth += curr_alpha * v_th[ram_cell_tech_type];
- g_tp.cam_cell.C_g_ideal += curr_alpha * c_g_ideal[ram_cell_tech_type];
- g_tp.cam_cell.C_fringe += curr_alpha * c_fringe[ram_cell_tech_type];
- g_tp.cam_cell.C_junc += curr_alpha * c_junc[ram_cell_tech_type];
- g_tp.cam_cell.C_junc_sidewall = 0.25e-15; // F/micron
- g_tp.cam_cell.I_on_n += curr_alpha * I_on_n[ram_cell_tech_type];
- g_tp.cam_cell.R_nch_on += curr_alpha * Rnchannelon[ram_cell_tech_type];
- g_tp.cam_cell.R_pch_on += curr_alpha * Rpchannelon[ram_cell_tech_type];
- g_tp.cam_cell.n_to_p_eff_curr_drv_ratio +=
- curr_alpha * n_to_p_eff_curr_drv_ratio[ram_cell_tech_type];
- g_tp.cam_cell.long_channel_leakage_reduction +=
- curr_alpha * long_channel_leakage_reduction[ram_cell_tech_type];
- g_tp.cam_cell.I_off_n +=
- curr_alpha * I_off_n[ram_cell_tech_type][g_ip->temp - 300];
- g_tp.cam_cell.I_off_p +=
- curr_alpha * I_off_n[ram_cell_tech_type][g_ip->temp - 300];
- g_tp.cam_cell.I_g_on_n +=
- curr_alpha * I_g_on_n[ram_cell_tech_type][g_ip->temp - 300];
- g_tp.cam_cell.I_g_on_p +=
- curr_alpha * I_g_on_n[ram_cell_tech_type][g_ip->temp - 300];
-
- g_tp.dram.cell_a_w += curr_alpha * curr_Wmemcella_dram;
- g_tp.dram.cell_pmos_w += curr_alpha * curr_Wmemcellpmos_dram;
- g_tp.dram.cell_nmos_w += curr_alpha * curr_Wmemcellnmos_dram;
- area_cell_dram += curr_alpha * curr_area_cell_dram;
- asp_ratio_cell_dram += curr_alpha * curr_asp_ratio_cell_dram;
-
- g_tp.sram.cell_a_w += curr_alpha * curr_Wmemcella_sram;
- g_tp.sram.cell_pmos_w += curr_alpha * curr_Wmemcellpmos_sram;
- g_tp.sram.cell_nmos_w += curr_alpha * curr_Wmemcellnmos_sram;
- area_cell_sram += curr_alpha * curr_area_cell_sram;
- asp_ratio_cell_sram += curr_alpha * curr_asp_ratio_cell_sram;
-
- g_tp.cam.cell_a_w += curr_alpha * curr_Wmemcella_cam; // sheng
- g_tp.cam.cell_pmos_w += curr_alpha * curr_Wmemcellpmos_cam;
- g_tp.cam.cell_nmos_w += curr_alpha * curr_Wmemcellnmos_cam;
- area_cell_cam += curr_alpha * curr_area_cell_cam;
- asp_ratio_cell_cam += curr_alpha * curr_asp_ratio_cell_cam;
-
- // Sense amplifier latch Gm calculation
- mobility_eff_periph_global +=
- curr_alpha * mobility_eff[peri_global_tech_type];
- Vdsat_periph_global += curr_alpha * Vdsat[peri_global_tech_type];
-
- // Empirical undifferetiated core/FU coefficient
- g_tp.scaling_factor.logic_scaling_co_eff +=
- curr_alpha * curr_logic_scaling_co_eff;
- g_tp.scaling_factor.core_tx_density += curr_alpha * curr_core_tx_density;
- g_tp.chip_layout_overhead += curr_alpha * curr_chip_layout_overhead;
- g_tp.macro_layout_overhead += curr_alpha * curr_macro_layout_overhead;
- g_tp.sckt_co_eff += curr_alpha * curr_sckt_co_eff;
- }
-
- // Currently we are not modeling the resistance/capacitance of poly anywhere.
- // Continuous function (or date have been processed) does not need linear
- // interpolation
- g_tp.w_comp_inv_p1 =
- 12.5 * g_ip->F_sz_um; // this was 10 micron for the 0.8 micron process
- g_tp.w_comp_inv_n1 =
- 7.5 * g_ip->F_sz_um; // this was 6 micron for the 0.8 micron process
- g_tp.w_comp_inv_p2 =
- 25 * g_ip->F_sz_um; // this was 20 micron for the 0.8 micron process
- g_tp.w_comp_inv_n2 =
- 15 * g_ip->F_sz_um; // this was 12 micron for the 0.8 micron process
- g_tp.w_comp_inv_p3 =
- 50 * g_ip->F_sz_um; // this was 40 micron for the 0.8 micron process
- g_tp.w_comp_inv_n3 =
- 30 * g_ip->F_sz_um; // this was 24 micron for the 0.8 micron process
- g_tp.w_eval_inv_p =
- 100 * g_ip->F_sz_um; // this was 80 micron for the 0.8 micron process
- g_tp.w_eval_inv_n =
- 50 * g_ip->F_sz_um; // this was 40 micron for the 0.8 micron process
- g_tp.w_comp_n =
- 12.5 * g_ip->F_sz_um; // this was 10 micron for the 0.8 micron process
- g_tp.w_comp_p =
- 37.5 * g_ip->F_sz_um; // this was 30 micron for the 0.8 micron process
-
- g_tp.MIN_GAP_BET_P_AND_N_DIFFS = 5 * g_ip->F_sz_um;
- g_tp.MIN_GAP_BET_SAME_TYPE_DIFFS = 1.5 * g_ip->F_sz_um;
- g_tp.HPOWERRAIL = 2 * g_ip->F_sz_um;
- g_tp.cell_h_def = 50 * g_ip->F_sz_um;
- g_tp.w_poly_contact = g_ip->F_sz_um;
- g_tp.spacing_poly_to_contact = g_ip->F_sz_um;
- g_tp.spacing_poly_to_poly = 1.5 * g_ip->F_sz_um;
- g_tp.ram_wl_stitching_overhead_ = 7.5 * g_ip->F_sz_um;
-
- g_tp.min_w_nmos_ = 3 * g_ip->F_sz_um / 2;
- g_tp.max_w_nmos_ = 100 * g_ip->F_sz_um;
- g_tp.w_iso = 12.5 * g_ip->F_sz_um; // was 10 micron for the 0.8 micron
- // process
- g_tp.w_sense_n = 3.75 * g_ip->F_sz_um; // sense amplifier N-trans; was 3
- // micron for the 0.8 micron process
- g_tp.w_sense_p = 7.5 * g_ip->F_sz_um; // sense amplifier P-trans; was 6
- // micron for the 0.8 micron process
- g_tp.w_sense_en =
- 5 * g_ip->F_sz_um; // Sense enable transistor of the sense amplifier; was
- // 4 micron for the 0.8 micron process
- g_tp.w_nmos_b_mux = 6 * g_tp.min_w_nmos_;
- g_tp.w_nmos_sa_mux = 6 * g_tp.min_w_nmos_;
-
- if (ram_cell_tech_type == comm_dram) {
- g_tp.max_w_nmos_dec = 8 * g_ip->F_sz_um;
- g_tp.h_dec = 8; // in the unit of memory cell height
- } else {
- g_tp.max_w_nmos_dec = g_tp.max_w_nmos_;
- g_tp.h_dec = 4; // in the unit of memory cell height
- }
-
- g_tp.peri_global.C_overlap = 0.2 * g_tp.peri_global.C_g_ideal;
- g_tp.sram_cell.C_overlap = 0.2 * g_tp.sram_cell.C_g_ideal;
- g_tp.cam_cell.C_overlap = 0.2 * g_tp.cam_cell.C_g_ideal;
-
- g_tp.dram_acc.C_overlap = 0.2 * g_tp.dram_acc.C_g_ideal;
- g_tp.dram_acc.R_nch_on = g_tp.dram_cell_Vdd / g_tp.dram_acc.I_on_n;
- // g_tp.dram_acc.R_pch_on = g_tp.dram_cell_Vdd / g_tp.dram_acc.I_on_p;
-
- g_tp.dram_wl.C_overlap = 0.2 * g_tp.dram_wl.C_g_ideal;
-
- double gmn_sense_amp_latch =
- (mobility_eff_periph_global / 2) * g_tp.peri_global.C_ox *
- (g_tp.w_sense_n / g_tp.peri_global.l_elec) * Vdsat_periph_global;
- double gmp_sense_amp_latch =
- gmp_to_gmn_multiplier_periph_global * gmn_sense_amp_latch;
- g_tp.gm_sense_amp_latch = gmn_sense_amp_latch + gmp_sense_amp_latch;
-
- g_tp.dram.b_w = sqrt(area_cell_dram / (asp_ratio_cell_dram));
- g_tp.dram.b_h = asp_ratio_cell_dram * g_tp.dram.b_w;
- g_tp.sram.b_w = sqrt(area_cell_sram / (asp_ratio_cell_sram));
- g_tp.sram.b_h = asp_ratio_cell_sram * g_tp.sram.b_w;
- g_tp.cam.b_w = sqrt(area_cell_cam / (asp_ratio_cell_cam)); // Sheng
- g_tp.cam.b_h = asp_ratio_cell_cam * g_tp.cam.b_w;
-
- g_tp.dram.Vbitpre = g_tp.dram_cell_Vdd;
- g_tp.sram.Vbitpre = vdd[ram_cell_tech_type];
- g_tp.cam.Vbitpre = vdd[ram_cell_tech_type]; // Sheng
- pmos_to_nmos_sizing_r = pmos_to_nmos_sz_ratio();
- g_tp.w_pmos_bl_precharge = 6 * pmos_to_nmos_sizing_r * g_tp.min_w_nmos_;
- g_tp.w_pmos_bl_eq = pmos_to_nmos_sizing_r * g_tp.min_w_nmos_;
-
- double wire_pitch[NUMBER_INTERCONNECT_PROJECTION_TYPES][NUMBER_WIRE_TYPES],
- wire_r_per_micron[NUMBER_INTERCONNECT_PROJECTION_TYPES]
- [NUMBER_WIRE_TYPES],
- wire_c_per_micron[NUMBER_INTERCONNECT_PROJECTION_TYPES]
- [NUMBER_WIRE_TYPES],
- horiz_dielectric_constant[NUMBER_INTERCONNECT_PROJECTION_TYPES]
- [NUMBER_WIRE_TYPES],
- vert_dielectric_constant[NUMBER_INTERCONNECT_PROJECTION_TYPES]
- [NUMBER_WIRE_TYPES],
- aspect_ratio[NUMBER_INTERCONNECT_PROJECTION_TYPES][NUMBER_WIRE_TYPES],
- miller_value[NUMBER_INTERCONNECT_PROJECTION_TYPES][NUMBER_WIRE_TYPES],
- ild_thickness[NUMBER_INTERCONNECT_PROJECTION_TYPES][NUMBER_WIRE_TYPES];
-
- for (iter = 0; iter <= 1; ++iter) {
- // linear interpolation
- if (iter == 0) {
- tech = tech_lo;
- if (tech_lo == tech_hi) {
- curr_alpha = 1;
- } else {
- curr_alpha = (technology - tech_hi) / (tech_lo - tech_hi);
- }
- } else {
- tech = tech_hi;
- if (tech_lo == tech_hi) {
- break;
- } else {
- curr_alpha = (tech_lo - technology) / (tech_lo - tech_hi);
- }
- }
-
- if (tech == 90) {
- // Aggressive projections
- wire_pitch[0][0] = 2.5 * g_ip->F_sz_um; // micron
- aspect_ratio[0][0] = 2.4;
- wire_width = wire_pitch[0][0] / 2; // micron
- wire_thickness = aspect_ratio[0][0] * wire_width; // micron
- wire_spacing = wire_pitch[0][0] - wire_width; // micron
- barrier_thickness = 0.01; // micron
- dishing_thickness = 0; // micron
- alpha_scatter = 1;
- wire_r_per_micron[0][0] = wire_resistance(
- CU_RESISTIVITY, wire_width, wire_thickness, barrier_thickness,
- dishing_thickness, alpha_scatter); // ohm/micron
- ild_thickness[0][0] = 0.48; // micron
- miller_value[0][0] = 1.5;
- horiz_dielectric_constant[0][0] = 2.709;
- vert_dielectric_constant[0][0] = 3.9;
- fringe_cap = 0.115e-15; // F/micron
- wire_c_per_micron[0][0] = wire_capacitance(
- wire_width, wire_thickness, wire_spacing, ild_thickness[0][0],
- miller_value[0][0], horiz_dielectric_constant[0][0],
- vert_dielectric_constant[0][0],
- fringe_cap); // F/micron.
-
- wire_pitch[0][1] = 4 * g_ip->F_sz_um;
- wire_width = wire_pitch[0][1] / 2;
- aspect_ratio[0][1] = 2.4;
- wire_thickness = aspect_ratio[0][1] * wire_width;
- wire_spacing = wire_pitch[0][1] - wire_width;
- wire_r_per_micron[0][1] =
- wire_resistance(CU_RESISTIVITY, wire_width, wire_thickness,
- barrier_thickness, dishing_thickness, alpha_scatter);
- ild_thickness[0][1] = 0.48; // micron
- miller_value[0][1] = 1.5;
- horiz_dielectric_constant[0][1] = 2.709;
- vert_dielectric_constant[0][1] = 3.9;
- wire_c_per_micron[0][1] = wire_capacitance(
- wire_width, wire_thickness, wire_spacing, ild_thickness[0][1],
- miller_value[0][1], horiz_dielectric_constant[0][1],
- vert_dielectric_constant[0][1], fringe_cap);
-
- wire_pitch[0][2] = 8 * g_ip->F_sz_um;
- aspect_ratio[0][2] = 2.7;
- wire_width = wire_pitch[0][2] / 2;
- wire_thickness = aspect_ratio[0][2] * wire_width;
- wire_spacing = wire_pitch[0][2] - wire_width;
- wire_r_per_micron[0][2] =
- wire_resistance(CU_RESISTIVITY, wire_width, wire_thickness,
- barrier_thickness, dishing_thickness, alpha_scatter);
- ild_thickness[0][2] = 0.96;
- miller_value[0][2] = 1.5;
- horiz_dielectric_constant[0][2] = 2.709;
- vert_dielectric_constant[0][2] = 3.9;
- wire_c_per_micron[0][2] = wire_capacitance(
- wire_width, wire_thickness, wire_spacing, ild_thickness[0][2],
- miller_value[0][2], horiz_dielectric_constant[0][2],
- vert_dielectric_constant[0][2], fringe_cap);
-
- // Conservative projections
- wire_pitch[1][0] = 2.5 * g_ip->F_sz_um;
- aspect_ratio[1][0] = 2.0;
- wire_width = wire_pitch[1][0] / 2;
- wire_thickness = aspect_ratio[1][0] * wire_width;
- wire_spacing = wire_pitch[1][0] - wire_width;
- barrier_thickness = 0.008;
- dishing_thickness = 0;
- alpha_scatter = 1;
- wire_r_per_micron[1][0] =
- wire_resistance(CU_RESISTIVITY, wire_width, wire_thickness,
- barrier_thickness, dishing_thickness, alpha_scatter);
- ild_thickness[1][0] = 0.48;
- miller_value[1][0] = 1.5;
- horiz_dielectric_constant[1][0] = 3.038;
- vert_dielectric_constant[1][0] = 3.9;
- fringe_cap = 0.115e-15;
- wire_c_per_micron[1][0] = wire_capacitance(
- wire_width, wire_thickness, wire_spacing, ild_thickness[1][0],
- miller_value[1][0], horiz_dielectric_constant[1][0],
- vert_dielectric_constant[1][0], fringe_cap);
-
- wire_pitch[1][1] = 4 * g_ip->F_sz_um;
- wire_width = wire_pitch[1][1] / 2;
- aspect_ratio[1][1] = 2.0;
- wire_thickness = aspect_ratio[1][1] * wire_width;
- wire_spacing = wire_pitch[1][1] - wire_width;
- wire_r_per_micron[1][1] =
- wire_resistance(CU_RESISTIVITY, wire_width, wire_thickness,
- barrier_thickness, dishing_thickness, alpha_scatter);
- ild_thickness[1][1] = 0.48;
- miller_value[1][1] = 1.5;
- horiz_dielectric_constant[1][1] = 3.038;
- vert_dielectric_constant[1][1] = 3.9;
- wire_c_per_micron[1][1] = wire_capacitance(
- wire_width, wire_thickness, wire_spacing, ild_thickness[1][1],
- miller_value[1][1], horiz_dielectric_constant[1][1],
- vert_dielectric_constant[1][1], fringe_cap);
-
- wire_pitch[1][2] = 8 * g_ip->F_sz_um;
- aspect_ratio[1][2] = 2.2;
- wire_width = wire_pitch[1][2] / 2;
- wire_thickness = aspect_ratio[1][2] * wire_width;
- wire_spacing = wire_pitch[1][2] - wire_width;
- dishing_thickness = 0.1 * wire_thickness;
- wire_r_per_micron[1][2] =
- wire_resistance(CU_RESISTIVITY, wire_width, wire_thickness,
- barrier_thickness, dishing_thickness, alpha_scatter);
- ild_thickness[1][2] = 1.1;
- miller_value[1][2] = 1.5;
- horiz_dielectric_constant[1][2] = 3.038;
- vert_dielectric_constant[1][2] = 3.9;
- wire_c_per_micron[1][2] = wire_capacitance(
- wire_width, wire_thickness, wire_spacing, ild_thickness[1][2],
- miller_value[1][2], horiz_dielectric_constant[1][2],
- vert_dielectric_constant[1][2], fringe_cap);
- // Nominal projections for commodity DRAM wordline/bitline
- wire_pitch[1][3] = 2 * 0.09;
- wire_c_per_micron[1][3] = 60e-15 / (256 * 2 * 0.09);
- wire_r_per_micron[1][3] = 12 / 0.09;
- } else if (tech == 65) {
- // Aggressive projections
- wire_pitch[0][0] = 2.5 * g_ip->F_sz_um;
- aspect_ratio[0][0] = 2.7;
- wire_width = wire_pitch[0][0] / 2;
- wire_thickness = aspect_ratio[0][0] * wire_width;
- wire_spacing = wire_pitch[0][0] - wire_width;
- barrier_thickness = 0;
- dishing_thickness = 0;
- alpha_scatter = 1;
- wire_r_per_micron[0][0] =
- wire_resistance(BULK_CU_RESISTIVITY, wire_width, wire_thickness,
- barrier_thickness, dishing_thickness, alpha_scatter);
- ild_thickness[0][0] = 0.405;
- miller_value[0][0] = 1.5;
- horiz_dielectric_constant[0][0] = 2.303;
- vert_dielectric_constant[0][0] = 3.9;
- fringe_cap = 0.115e-15;
- wire_c_per_micron[0][0] = wire_capacitance(
- wire_width, wire_thickness, wire_spacing, ild_thickness[0][0],
- miller_value[0][0], horiz_dielectric_constant[0][0],
- vert_dielectric_constant[0][0], fringe_cap);
-
- wire_pitch[0][1] = 4 * g_ip->F_sz_um;
- wire_width = wire_pitch[0][1] / 2;
- aspect_ratio[0][1] = 2.7;
- wire_thickness = aspect_ratio[0][1] * wire_width;
- wire_spacing = wire_pitch[0][1] - wire_width;
- wire_r_per_micron[0][1] =
- wire_resistance(BULK_CU_RESISTIVITY, wire_width, wire_thickness,
- barrier_thickness, dishing_thickness, alpha_scatter);
- ild_thickness[0][1] = 0.405;
- miller_value[0][1] = 1.5;
- horiz_dielectric_constant[0][1] = 2.303;
- vert_dielectric_constant[0][1] = 3.9;
- wire_c_per_micron[0][1] = wire_capacitance(
- wire_width, wire_thickness, wire_spacing, ild_thickness[0][1],
- miller_value[0][1], horiz_dielectric_constant[0][1],
- vert_dielectric_constant[0][1], fringe_cap);
-
- wire_pitch[0][2] = 8 * g_ip->F_sz_um;
- aspect_ratio[0][2] = 2.8;
- wire_width = wire_pitch[0][2] / 2;
- wire_thickness = aspect_ratio[0][2] * wire_width;
- wire_spacing = wire_pitch[0][2] - wire_width;
- wire_r_per_micron[0][2] =
- wire_resistance(BULK_CU_RESISTIVITY, wire_width, wire_thickness,
- barrier_thickness, dishing_thickness, alpha_scatter);
- ild_thickness[0][2] = 0.81;
- miller_value[0][2] = 1.5;
- horiz_dielectric_constant[0][2] = 2.303;
- vert_dielectric_constant[0][2] = 3.9;
- wire_c_per_micron[0][2] = wire_capacitance(
- wire_width, wire_thickness, wire_spacing, ild_thickness[0][2],
- miller_value[0][2], horiz_dielectric_constant[0][2],
- vert_dielectric_constant[0][2], fringe_cap);
-
- // Conservative projections
- wire_pitch[1][0] = 2.5 * g_ip->F_sz_um;
- aspect_ratio[1][0] = 2.0;
- wire_width = wire_pitch[1][0] / 2;
- wire_thickness = aspect_ratio[1][0] * wire_width;
- wire_spacing = wire_pitch[1][0] - wire_width;
- barrier_thickness = 0.006;
- dishing_thickness = 0;
- alpha_scatter = 1;
- wire_r_per_micron[1][0] =
- wire_resistance(CU_RESISTIVITY, wire_width, wire_thickness,
- barrier_thickness, dishing_thickness, alpha_scatter);
- ild_thickness[1][0] = 0.405;
- miller_value[1][0] = 1.5;
- horiz_dielectric_constant[1][0] = 2.734;
- vert_dielectric_constant[1][0] = 3.9;
- fringe_cap = 0.115e-15;
- wire_c_per_micron[1][0] = wire_capacitance(
- wire_width, wire_thickness, wire_spacing, ild_thickness[1][0],
- miller_value[1][0], horiz_dielectric_constant[1][0],
- vert_dielectric_constant[1][0], fringe_cap);
-
- wire_pitch[1][1] = 4 * g_ip->F_sz_um;
- wire_width = wire_pitch[1][1] / 2;
- aspect_ratio[1][1] = 2.0;
- wire_thickness = aspect_ratio[1][1] * wire_width;
- wire_spacing = wire_pitch[1][1] - wire_width;
- wire_r_per_micron[1][1] =
- wire_resistance(CU_RESISTIVITY, wire_width, wire_thickness,
- barrier_thickness, dishing_thickness, alpha_scatter);
- ild_thickness[1][1] = 0.405;
- miller_value[1][1] = 1.5;
- horiz_dielectric_constant[1][1] = 2.734;
- vert_dielectric_constant[1][1] = 3.9;
- wire_c_per_micron[1][1] = wire_capacitance(
- wire_width, wire_thickness, wire_spacing, ild_thickness[1][1],
- miller_value[1][1], horiz_dielectric_constant[1][1],
- vert_dielectric_constant[1][1], fringe_cap);
-
- wire_pitch[1][2] = 8 * g_ip->F_sz_um;
- aspect_ratio[1][2] = 2.2;
- wire_width = wire_pitch[1][2] / 2;
- wire_thickness = aspect_ratio[1][2] * wire_width;
- wire_spacing = wire_pitch[1][2] - wire_width;
- dishing_thickness = 0.1 * wire_thickness;
- wire_r_per_micron[1][2] =
- wire_resistance(CU_RESISTIVITY, wire_width, wire_thickness,
- barrier_thickness, dishing_thickness, alpha_scatter);
- ild_thickness[1][2] = 0.77;
- miller_value[1][2] = 1.5;
- horiz_dielectric_constant[1][2] = 2.734;
- vert_dielectric_constant[1][2] = 3.9;
- wire_c_per_micron[1][2] = wire_capacitance(
- wire_width, wire_thickness, wire_spacing, ild_thickness[1][2],
- miller_value[1][2], horiz_dielectric_constant[1][2],
- vert_dielectric_constant[1][2], fringe_cap);
- // Nominal projections for commodity DRAM wordline/bitline
- wire_pitch[1][3] = 2 * 0.065;
- wire_c_per_micron[1][3] = 52.5e-15 / (256 * 2 * 0.065);
- wire_r_per_micron[1][3] = 12 / 0.065;
- } else if (tech == 45) {
- // Aggressive projections.
- wire_pitch[0][0] = 2.5 * g_ip->F_sz_um;
- aspect_ratio[0][0] = 3.0;
- wire_width = wire_pitch[0][0] / 2;
- wire_thickness = aspect_ratio[0][0] * wire_width;
- wire_spacing = wire_pitch[0][0] - wire_width;
- barrier_thickness = 0;
- dishing_thickness = 0;
- alpha_scatter = 1;
- wire_r_per_micron[0][0] =
- wire_resistance(BULK_CU_RESISTIVITY, wire_width, wire_thickness,
- barrier_thickness, dishing_thickness, alpha_scatter);
- ild_thickness[0][0] = 0.315;
- miller_value[0][0] = 1.5;
- horiz_dielectric_constant[0][0] = 1.958;
- vert_dielectric_constant[0][0] = 3.9;
- fringe_cap = 0.115e-15;
- wire_c_per_micron[0][0] = wire_capacitance(
- wire_width, wire_thickness, wire_spacing, ild_thickness[0][0],
- miller_value[0][0], horiz_dielectric_constant[0][0],
- vert_dielectric_constant[0][0], fringe_cap);
-
- wire_pitch[0][1] = 4 * g_ip->F_sz_um;
- wire_width = wire_pitch[0][1] / 2;
- aspect_ratio[0][1] = 3.0;
- wire_thickness = aspect_ratio[0][1] * wire_width;
- wire_spacing = wire_pitch[0][1] - wire_width;
- wire_r_per_micron[0][1] =
- wire_resistance(BULK_CU_RESISTIVITY, wire_width, wire_thickness,
- barrier_thickness, dishing_thickness, alpha_scatter);
- ild_thickness[0][1] = 0.315;
- miller_value[0][1] = 1.5;
- horiz_dielectric_constant[0][1] = 1.958;
- vert_dielectric_constant[0][1] = 3.9;
- wire_c_per_micron[0][1] = wire_capacitance(
- wire_width, wire_thickness, wire_spacing, ild_thickness[0][1],
- miller_value[0][1], horiz_dielectric_constant[0][1],
- vert_dielectric_constant[0][1], fringe_cap);
-
- wire_pitch[0][2] = 8 * g_ip->F_sz_um;
- aspect_ratio[0][2] = 3.0;
- wire_width = wire_pitch[0][2] / 2;
- wire_thickness = aspect_ratio[0][2] * wire_width;
- wire_spacing = wire_pitch[0][2] - wire_width;
- wire_r_per_micron[0][2] =
- wire_resistance(BULK_CU_RESISTIVITY, wire_width, wire_thickness,
- barrier_thickness, dishing_thickness, alpha_scatter);
- ild_thickness[0][2] = 0.63;
- miller_value[0][2] = 1.5;
- horiz_dielectric_constant[0][2] = 1.958;
- vert_dielectric_constant[0][2] = 3.9;
- wire_c_per_micron[0][2] = wire_capacitance(
- wire_width, wire_thickness, wire_spacing, ild_thickness[0][2],
- miller_value[0][2], horiz_dielectric_constant[0][2],
- vert_dielectric_constant[0][2], fringe_cap);
-
- // Conservative projections
- wire_pitch[1][0] = 2.5 * g_ip->F_sz_um;
- aspect_ratio[1][0] = 2.0;
- wire_width = wire_pitch[1][0] / 2;
- wire_thickness = aspect_ratio[1][0] * wire_width;
- wire_spacing = wire_pitch[1][0] - wire_width;
- barrier_thickness = 0.004;
- dishing_thickness = 0;
- alpha_scatter = 1;
- wire_r_per_micron[1][0] =
- wire_resistance(CU_RESISTIVITY, wire_width, wire_thickness,
- barrier_thickness, dishing_thickness, alpha_scatter);
- ild_thickness[1][0] = 0.315;
- miller_value[1][0] = 1.5;
- horiz_dielectric_constant[1][0] = 2.46;
- vert_dielectric_constant[1][0] = 3.9;
- fringe_cap = 0.115e-15;
- wire_c_per_micron[1][0] = wire_capacitance(
- wire_width, wire_thickness, wire_spacing, ild_thickness[1][0],
- miller_value[1][0], horiz_dielectric_constant[1][0],
- vert_dielectric_constant[1][0], fringe_cap);
-
- wire_pitch[1][1] = 4 * g_ip->F_sz_um;
- wire_width = wire_pitch[1][1] / 2;
- aspect_ratio[1][1] = 2.0;
- wire_thickness = aspect_ratio[1][1] * wire_width;
- wire_spacing = wire_pitch[1][1] - wire_width;
- wire_r_per_micron[1][1] =
- wire_resistance(CU_RESISTIVITY, wire_width, wire_thickness,
- barrier_thickness, dishing_thickness, alpha_scatter);
- ild_thickness[1][1] = 0.315;
- miller_value[1][1] = 1.5;
- horiz_dielectric_constant[1][1] = 2.46;
- vert_dielectric_constant[1][1] = 3.9;
- fringe_cap = 0.115e-15;
- wire_c_per_micron[1][1] = wire_capacitance(
- wire_width, wire_thickness, wire_spacing, ild_thickness[1][1],
- miller_value[1][1], horiz_dielectric_constant[1][1],
- vert_dielectric_constant[1][1], fringe_cap);
-
- wire_pitch[1][2] = 8 * g_ip->F_sz_um;
- aspect_ratio[1][2] = 2.2;
- wire_width = wire_pitch[1][2] / 2;
- wire_thickness = aspect_ratio[1][2] * wire_width;
- wire_spacing = wire_pitch[1][2] - wire_width;
- dishing_thickness = 0.1 * wire_thickness;
- wire_r_per_micron[1][2] =
- wire_resistance(CU_RESISTIVITY, wire_width, wire_thickness,
- barrier_thickness, dishing_thickness, alpha_scatter);
- ild_thickness[1][2] = 0.55;
- miller_value[1][2] = 1.5;
- horiz_dielectric_constant[1][2] = 2.46;
- vert_dielectric_constant[1][2] = 3.9;
- wire_c_per_micron[1][2] = wire_capacitance(
- wire_width, wire_thickness, wire_spacing, ild_thickness[1][2],
- miller_value[1][2], horiz_dielectric_constant[1][2],
- vert_dielectric_constant[1][2], fringe_cap);
- // Nominal projections for commodity DRAM wordline/bitline
- wire_pitch[1][3] = 2 * 0.045;
- wire_c_per_micron[1][3] = 37.5e-15 / (256 * 2 * 0.045);
- wire_r_per_micron[1][3] = 12 / 0.045;
- } else if (tech == 32) {
- // Aggressive projections.
- wire_pitch[0][0] = 2.5 * g_ip->F_sz_um;
- aspect_ratio[0][0] = 3.0;
- wire_width = wire_pitch[0][0] / 2;
- wire_thickness = aspect_ratio[0][0] * wire_width;
- wire_spacing = wire_pitch[0][0] - wire_width;
- barrier_thickness = 0;
- dishing_thickness = 0;
- alpha_scatter = 1;
- wire_r_per_micron[0][0] =
- wire_resistance(BULK_CU_RESISTIVITY, wire_width, wire_thickness,
- barrier_thickness, dishing_thickness, alpha_scatter);
- ild_thickness[0][0] = 0.21;
- miller_value[0][0] = 1.5;
- horiz_dielectric_constant[0][0] = 1.664;
- vert_dielectric_constant[0][0] = 3.9;
- fringe_cap = 0.115e-15;
- wire_c_per_micron[0][0] = wire_capacitance(
- wire_width, wire_thickness, wire_spacing, ild_thickness[0][0],
- miller_value[0][0], horiz_dielectric_constant[0][0],
- vert_dielectric_constant[0][0], fringe_cap);
-
- wire_pitch[0][1] = 4 * g_ip->F_sz_um;
- wire_width = wire_pitch[0][1] / 2;
- aspect_ratio[0][1] = 3.0;
- wire_thickness = aspect_ratio[0][1] * wire_width;
- wire_spacing = wire_pitch[0][1] - wire_width;
- wire_r_per_micron[0][1] =
- wire_resistance(BULK_CU_RESISTIVITY, wire_width, wire_thickness,
- barrier_thickness, dishing_thickness, alpha_scatter);
- ild_thickness[0][1] = 0.21;
- miller_value[0][1] = 1.5;
- horiz_dielectric_constant[0][1] = 1.664;
- vert_dielectric_constant[0][1] = 3.9;
- wire_c_per_micron[0][1] = wire_capacitance(
- wire_width, wire_thickness, wire_spacing, ild_thickness[0][1],
- miller_value[0][1], horiz_dielectric_constant[0][1],
- vert_dielectric_constant[0][1], fringe_cap);
-
- wire_pitch[0][2] = 8 * g_ip->F_sz_um;
- aspect_ratio[0][2] = 3.0;
- wire_width = wire_pitch[0][2] / 2;
- wire_thickness = aspect_ratio[0][2] * wire_width;
- wire_spacing = wire_pitch[0][2] - wire_width;
- wire_r_per_micron[0][2] =
- wire_resistance(BULK_CU_RESISTIVITY, wire_width, wire_thickness,
- barrier_thickness, dishing_thickness, alpha_scatter);
- ild_thickness[0][2] = 0.42;
- miller_value[0][2] = 1.5;
- horiz_dielectric_constant[0][2] = 1.664;
- vert_dielectric_constant[0][2] = 3.9;
- wire_c_per_micron[0][2] = wire_capacitance(
- wire_width, wire_thickness, wire_spacing, ild_thickness[0][2],
- miller_value[0][2], horiz_dielectric_constant[0][2],
- vert_dielectric_constant[0][2], fringe_cap);
-
- // Conservative projections
- wire_pitch[1][0] = 2.5 * g_ip->F_sz_um;
- aspect_ratio[1][0] = 2.0;
- wire_width = wire_pitch[1][0] / 2;
- wire_thickness = aspect_ratio[1][0] * wire_width;
- wire_spacing = wire_pitch[1][0] - wire_width;
- barrier_thickness = 0.003;
- dishing_thickness = 0;
- alpha_scatter = 1;
- wire_r_per_micron[1][0] =
- wire_resistance(CU_RESISTIVITY, wire_width, wire_thickness,
- barrier_thickness, dishing_thickness, alpha_scatter);
- ild_thickness[1][0] = 0.21;
- miller_value[1][0] = 1.5;
- horiz_dielectric_constant[1][0] = 2.214;
- vert_dielectric_constant[1][0] = 3.9;
- fringe_cap = 0.115e-15;
- wire_c_per_micron[1][0] = wire_capacitance(
- wire_width, wire_thickness, wire_spacing, ild_thickness[1][0],
- miller_value[1][0], horiz_dielectric_constant[1][0],
- vert_dielectric_constant[1][0], fringe_cap);
-
- wire_pitch[1][1] = 4 * g_ip->F_sz_um;
- aspect_ratio[1][1] = 2.0;
- wire_width = wire_pitch[1][1] / 2;
- wire_thickness = aspect_ratio[1][1] * wire_width;
- wire_spacing = wire_pitch[1][1] - wire_width;
- wire_r_per_micron[1][1] =
- wire_resistance(CU_RESISTIVITY, wire_width, wire_thickness,
- barrier_thickness, dishing_thickness, alpha_scatter);
- ild_thickness[1][1] = 0.21;
- miller_value[1][1] = 1.5;
- horiz_dielectric_constant[1][1] = 2.214;
- vert_dielectric_constant[1][1] = 3.9;
- wire_c_per_micron[1][1] = wire_capacitance(
- wire_width, wire_thickness, wire_spacing, ild_thickness[1][1],
- miller_value[1][1], horiz_dielectric_constant[1][1],
- vert_dielectric_constant[1][1], fringe_cap);
-
- wire_pitch[1][2] = 8 * g_ip->F_sz_um;
- aspect_ratio[1][2] = 2.2;
- wire_width = wire_pitch[1][2] / 2;
- wire_thickness = aspect_ratio[1][2] * wire_width;
- wire_spacing = wire_pitch[1][2] - wire_width;
- dishing_thickness = 0.1 * wire_thickness;
- wire_r_per_micron[1][2] =
- wire_resistance(CU_RESISTIVITY, wire_width, wire_thickness,
- barrier_thickness, dishing_thickness, alpha_scatter);
- ild_thickness[1][2] = 0.385;
- miller_value[1][2] = 1.5;
- horiz_dielectric_constant[1][2] = 2.214;
- vert_dielectric_constant[1][2] = 3.9;
- wire_c_per_micron[1][2] = wire_capacitance(
- wire_width, wire_thickness, wire_spacing, ild_thickness[1][2],
- miller_value[1][2], horiz_dielectric_constant[1][2],
- vert_dielectric_constant[1][2], fringe_cap);
- // Nominal projections for commodity DRAM wordline/bitline
- wire_pitch[1][3] = 2 * 0.032; // micron
- wire_c_per_micron[1][3] = 31e-15 / (256 * 2 * 0.032); // F/micron
- wire_r_per_micron[1][3] = 12 / 0.032; // ohm/micron
- } else if (tech == 22) {
- // Aggressive projections.
- wire_pitch[0][0] = 2.5 * g_ip->F_sz_um; // local
- aspect_ratio[0][0] = 3.0;
- wire_width = wire_pitch[0][0] / 2;
- wire_thickness = aspect_ratio[0][0] * wire_width;
- wire_spacing = wire_pitch[0][0] - wire_width;
- barrier_thickness = 0;
- dishing_thickness = 0;
- alpha_scatter = 1;
- wire_r_per_micron[0][0] =
- wire_resistance(BULK_CU_RESISTIVITY, wire_width, wire_thickness,
- barrier_thickness, dishing_thickness, alpha_scatter);
- ild_thickness[0][0] = 0.15;
- miller_value[0][0] = 1.5;
- horiz_dielectric_constant[0][0] = 1.414;
- vert_dielectric_constant[0][0] = 3.9;
- fringe_cap = 0.115e-15;
- wire_c_per_micron[0][0] = wire_capacitance(
- wire_width, wire_thickness, wire_spacing, ild_thickness[0][0],
- miller_value[0][0], horiz_dielectric_constant[0][0],
- vert_dielectric_constant[0][0], fringe_cap);
-
- wire_pitch[0][1] = 4 * g_ip->F_sz_um; // semi-global
- wire_width = wire_pitch[0][1] / 2;
- aspect_ratio[0][1] = 3.0;
- wire_thickness = aspect_ratio[0][1] * wire_width;
- wire_spacing = wire_pitch[0][1] - wire_width;
- wire_r_per_micron[0][1] =
- wire_resistance(BULK_CU_RESISTIVITY, wire_width, wire_thickness,
- barrier_thickness, dishing_thickness, alpha_scatter);
- ild_thickness[0][1] = 0.15;
- miller_value[0][1] = 1.5;
- horiz_dielectric_constant[0][1] = 1.414;
- vert_dielectric_constant[0][1] = 3.9;
- wire_c_per_micron[0][1] = wire_capacitance(
- wire_width, wire_thickness, wire_spacing, ild_thickness[0][1],
- miller_value[0][1], horiz_dielectric_constant[0][1],
- vert_dielectric_constant[0][1], fringe_cap);
-
- wire_pitch[0][2] = 8 * g_ip->F_sz_um; // global
- aspect_ratio[0][2] = 3.0;
- wire_width = wire_pitch[0][2] / 2;
- wire_thickness = aspect_ratio[0][2] * wire_width;
- wire_spacing = wire_pitch[0][2] - wire_width;
- wire_r_per_micron[0][2] =
- wire_resistance(BULK_CU_RESISTIVITY, wire_width, wire_thickness,
- barrier_thickness, dishing_thickness, alpha_scatter);
- ild_thickness[0][2] = 0.3;
- miller_value[0][2] = 1.5;
- horiz_dielectric_constant[0][2] = 1.414;
- vert_dielectric_constant[0][2] = 3.9;
- wire_c_per_micron[0][2] = wire_capacitance(
- wire_width, wire_thickness, wire_spacing, ild_thickness[0][2],
- miller_value[0][2], horiz_dielectric_constant[0][2],
- vert_dielectric_constant[0][2], fringe_cap);
-
- // //*************************
- // wire_pitch[0][4] = 16 * g_ip.F_sz_um;//global
- // aspect_ratio = 3.0;
- // wire_width = wire_pitch[0][4] / 2;
- // wire_thickness = aspect_ratio * wire_width;
- // wire_spacing = wire_pitch[0][4] - wire_width;
- // wire_r_per_micron[0][4] = wire_resistance(BULK_CU_RESISTIVITY,
- // wire_width,
- // wire_thickness, barrier_thickness,
- // dishing_thickness, alpha_scatter);
- // ild_thickness = 0.3;
- // wire_c_per_micron[0][4] = wire_capacitance(wire_width,
- // wire_thickness, wire_spacing,
- // ild_thickness, miller_value,
- // horiz_dielectric_constant, vert_dielectric_constant,
- // fringe_cap);
- //
- // wire_pitch[0][5] = 24 * g_ip.F_sz_um;//global
- // aspect_ratio = 3.0;
- // wire_width = wire_pitch[0][5] / 2;
- // wire_thickness = aspect_ratio * wire_width;
- // wire_spacing = wire_pitch[0][5] - wire_width;
- // wire_r_per_micron[0][5] = wire_resistance(BULK_CU_RESISTIVITY,
- // wire_width,
- // wire_thickness, barrier_thickness,
- // dishing_thickness, alpha_scatter);
- // ild_thickness = 0.3;
- // wire_c_per_micron[0][5] = wire_capacitance(wire_width,
- // wire_thickness, wire_spacing,
- // ild_thickness, miller_value,
- // horiz_dielectric_constant, vert_dielectric_constant,
- // fringe_cap);
- //
- // wire_pitch[0][6] = 32 * g_ip.F_sz_um;//global
- // aspect_ratio = 3.0;
- // wire_width = wire_pitch[0][6] / 2;
- // wire_thickness = aspect_ratio * wire_width;
- // wire_spacing = wire_pitch[0][6] - wire_width;
- // wire_r_per_micron[0][6] = wire_resistance(BULK_CU_RESISTIVITY,
- // wire_width,
- // wire_thickness, barrier_thickness,
- // dishing_thickness, alpha_scatter);
- // ild_thickness = 0.3;
- // wire_c_per_micron[0][6] = wire_capacitance(wire_width,
- // wire_thickness, wire_spacing,
- // ild_thickness, miller_value,
- // horiz_dielectric_constant, vert_dielectric_constant,
- // fringe_cap);
- //*************************
-
- // Conservative projections
- wire_pitch[1][0] = 2.5 * g_ip->F_sz_um;
- aspect_ratio[1][0] = 2.0;
- wire_width = wire_pitch[1][0] / 2;
- wire_thickness = aspect_ratio[1][0] * wire_width;
- wire_spacing = wire_pitch[1][0] - wire_width;
- barrier_thickness = 0.003;
- dishing_thickness = 0;
- alpha_scatter = 1.05;
- wire_r_per_micron[1][0] =
- wire_resistance(CU_RESISTIVITY, wire_width, wire_thickness,
- barrier_thickness, dishing_thickness, alpha_scatter);
- ild_thickness[1][0] = 0.15;
- miller_value[1][0] = 1.5;
- horiz_dielectric_constant[1][0] = 2.104;
- vert_dielectric_constant[1][0] = 3.9;
- fringe_cap = 0.115e-15;
- wire_c_per_micron[1][0] = wire_capacitance(
- wire_width, wire_thickness, wire_spacing, ild_thickness[1][0],
- miller_value[1][0], horiz_dielectric_constant[1][0],
- vert_dielectric_constant[1][0], fringe_cap);
-
- wire_pitch[1][1] = 4 * g_ip->F_sz_um;
- wire_width = wire_pitch[1][1] / 2;
- aspect_ratio[1][1] = 2.0;
- wire_thickness = aspect_ratio[1][1] * wire_width;
- wire_spacing = wire_pitch[1][1] - wire_width;
- wire_r_per_micron[1][1] =
- wire_resistance(CU_RESISTIVITY, wire_width, wire_thickness,
- barrier_thickness, dishing_thickness, alpha_scatter);
- ild_thickness[1][1] = 0.15;
- miller_value[1][1] = 1.5;
- horiz_dielectric_constant[1][1] = 2.104;
- vert_dielectric_constant[1][1] = 3.9;
- wire_c_per_micron[1][1] = wire_capacitance(
- wire_width, wire_thickness, wire_spacing, ild_thickness[1][1],
- miller_value[1][1], horiz_dielectric_constant[1][1],
- vert_dielectric_constant[1][1], fringe_cap);
-
- wire_pitch[1][2] = 8 * g_ip->F_sz_um;
- aspect_ratio[1][2] = 2.2;
- wire_width = wire_pitch[1][2] / 2;
- wire_thickness = aspect_ratio[1][2] * wire_width;
- wire_spacing = wire_pitch[1][2] - wire_width;
- dishing_thickness = 0.1 * wire_thickness;
- wire_r_per_micron[1][2] =
- wire_resistance(CU_RESISTIVITY, wire_width, wire_thickness,
- barrier_thickness, dishing_thickness, alpha_scatter);
- ild_thickness[1][2] = 0.275;
- miller_value[1][2] = 1.5;
- horiz_dielectric_constant[1][2] = 2.104;
- vert_dielectric_constant[1][2] = 3.9;
- wire_c_per_micron[1][2] = wire_capacitance(
- wire_width, wire_thickness, wire_spacing, ild_thickness[1][2],
- miller_value[1][2], horiz_dielectric_constant[1][2],
- vert_dielectric_constant[1][2], fringe_cap);
- // Nominal projections for commodity DRAM wordline/bitline
- wire_pitch[1][3] = 2 * 0.022; // micron
- wire_c_per_micron[1][3] = 31e-15 / (256 * 2 * 0.022); // F/micron
- wire_r_per_micron[1][3] = 12 / 0.022; // ohm/micron
-
- //******************
- // wire_pitch[1][4] = 16 * g_ip.F_sz_um;
- // aspect_ratio = 2.2;
- // wire_width = wire_pitch[1][4] / 2;
- // wire_thickness = aspect_ratio * wire_width;
- // wire_spacing = wire_pitch[1][4] - wire_width;
- // dishing_thickness = 0.1 * wire_thickness;
- // wire_r_per_micron[1][4] = wire_resistance(CU_RESISTIVITY,
- // wire_width, wire_thickness,
- // barrier_thickness, dishing_thickness, alpha_scatter);
- // ild_thickness = 0.275; wire_c_per_micron[1][4] =
- // wire_capacitance(wire_width, wire_thickness, wire_spacing,
- // ild_thickness, miller_value, horiz_dielectric_constant,
- // vert_dielectric_constant, fringe_cap);
- //
- // wire_pitch[1][5] = 24 * g_ip.F_sz_um;
- // aspect_ratio = 2.2;
- // wire_width = wire_pitch[1][5] / 2;
- // wire_thickness = aspect_ratio * wire_width;
- // wire_spacing = wire_pitch[1][5] - wire_width;
- // dishing_thickness = 0.1 * wire_thickness;
- // wire_r_per_micron[1][5] = wire_resistance(CU_RESISTIVITY,
- // wire_width, wire_thickness,
- // barrier_thickness, dishing_thickness, alpha_scatter);
- // ild_thickness = 0.275; wire_c_per_micron[1][5] =
- // wire_capacitance(wire_width, wire_thickness, wire_spacing,
- // ild_thickness, miller_value, horiz_dielectric_constant,
- // vert_dielectric_constant, fringe_cap);
- //
- // wire_pitch[1][6] = 32 * g_ip.F_sz_um;
- // aspect_ratio = 2.2;
- // wire_width = wire_pitch[1][6] / 2;
- // wire_thickness = aspect_ratio * wire_width;
- // wire_spacing = wire_pitch[1][6] - wire_width;
- // dishing_thickness = 0.1 * wire_thickness;
- // wire_r_per_micron[1][6] = wire_resistance(CU_RESISTIVITY,
- // wire_width, wire_thickness,
- // barrier_thickness, dishing_thickness, alpha_scatter);
- // ild_thickness = 0.275; wire_c_per_micron[1][6] =
- // wire_capacitance(wire_width, wire_thickness, wire_spacing,
- // ild_thickness, miller_value, horiz_dielectric_constant,
- // vert_dielectric_constant, fringe_cap);
- }
-
- else if (tech == 16) {
- // Aggressive projections.
- wire_pitch[0][0] = 2.5 * g_ip->F_sz_um; // local
- aspect_ratio[0][0] = 3.0;
- wire_width = wire_pitch[0][0] / 2;
- wire_thickness = aspect_ratio[0][0] * wire_width;
- wire_spacing = wire_pitch[0][0] - wire_width;
- barrier_thickness = 0;
- dishing_thickness = 0;
- alpha_scatter = 1;
- wire_r_per_micron[0][0] =
- wire_resistance(BULK_CU_RESISTIVITY, wire_width, wire_thickness,
- barrier_thickness, dishing_thickness, alpha_scatter);
- ild_thickness[0][0] = 0.108;
- miller_value[0][0] = 1.5;
- horiz_dielectric_constant[0][0] = 1.202;
- vert_dielectric_constant[0][0] = 3.9;
- fringe_cap = 0.115e-15;
- wire_c_per_micron[0][0] = wire_capacitance(
- wire_width, wire_thickness, wire_spacing, ild_thickness[0][0],
- miller_value[0][0], horiz_dielectric_constant[0][0],
- vert_dielectric_constant[0][0], fringe_cap);
-
- wire_pitch[0][1] = 4 * g_ip->F_sz_um; // semi-global
- aspect_ratio[0][1] = 3.0;
- wire_width = wire_pitch[0][1] / 2;
- wire_thickness = aspect_ratio[0][1] * wire_width;
- wire_spacing = wire_pitch[0][1] - wire_width;
- wire_r_per_micron[0][1] =
- wire_resistance(BULK_CU_RESISTIVITY, wire_width, wire_thickness,
- barrier_thickness, dishing_thickness, alpha_scatter);
- ild_thickness[0][1] = 0.108;
- miller_value[0][1] = 1.5;
- horiz_dielectric_constant[0][1] = 1.202;
- vert_dielectric_constant[0][1] = 3.9;
- wire_c_per_micron[0][1] = wire_capacitance(
- wire_width, wire_thickness, wire_spacing, ild_thickness[0][1],
- miller_value[0][1], horiz_dielectric_constant[0][1],
- vert_dielectric_constant[0][1], fringe_cap);
-
- wire_pitch[0][2] = 8 * g_ip->F_sz_um; // global
- aspect_ratio[0][2] = 3.0;
- wire_width = wire_pitch[0][2] / 2;
- wire_thickness = aspect_ratio[0][2] * wire_width;
- wire_spacing = wire_pitch[0][2] - wire_width;
- wire_r_per_micron[0][2] =
- wire_resistance(BULK_CU_RESISTIVITY, wire_width, wire_thickness,
- barrier_thickness, dishing_thickness, alpha_scatter);
- ild_thickness[0][2] = 0.216;
- miller_value[0][2] = 1.5;
- horiz_dielectric_constant[0][2] = 1.202;
- vert_dielectric_constant[0][2] = 3.9;
- wire_c_per_micron[0][2] = wire_capacitance(
- wire_width, wire_thickness, wire_spacing, ild_thickness[0][2],
- miller_value[0][2], horiz_dielectric_constant[0][2],
- vert_dielectric_constant[0][2], fringe_cap);
-
- // //*************************
- // wire_pitch[0][4] = 16 * g_ip.F_sz_um;//global
- // aspect_ratio = 3.0;
- // wire_width = wire_pitch[0][4] / 2;
- // wire_thickness = aspect_ratio * wire_width;
- // wire_spacing = wire_pitch[0][4] - wire_width;
- // wire_r_per_micron[0][4] = wire_resistance(BULK_CU_RESISTIVITY,
- // wire_width,
- // wire_thickness, barrier_thickness,
- // dishing_thickness, alpha_scatter);
- // ild_thickness = 0.3;
- // wire_c_per_micron[0][4] = wire_capacitance(wire_width,
- // wire_thickness, wire_spacing,
- // ild_thickness, miller_value,
- // horiz_dielectric_constant, vert_dielectric_constant,
- // fringe_cap);
- //
- // wire_pitch[0][5] = 24 * g_ip.F_sz_um;//global
- // aspect_ratio = 3.0;
- // wire_width = wire_pitch[0][5] / 2;
- // wire_thickness = aspect_ratio * wire_width;
- // wire_spacing = wire_pitch[0][5] - wire_width;
- // wire_r_per_micron[0][5] = wire_resistance(BULK_CU_RESISTIVITY,
- // wire_width,
- // wire_thickness, barrier_thickness,
- // dishing_thickness, alpha_scatter);
- // ild_thickness = 0.3;
- // wire_c_per_micron[0][5] = wire_capacitance(wire_width,
- // wire_thickness, wire_spacing,
- // ild_thickness, miller_value,
- // horiz_dielectric_constant, vert_dielectric_constant,
- // fringe_cap);
- //
- // wire_pitch[0][6] = 32 * g_ip.F_sz_um;//global
- // aspect_ratio = 3.0;
- // wire_width = wire_pitch[0][6] / 2;
- // wire_thickness = aspect_ratio * wire_width;
- // wire_spacing = wire_pitch[0][6] - wire_width;
- // wire_r_per_micron[0][6] = wire_resistance(BULK_CU_RESISTIVITY,
- // wire_width,
- // wire_thickness, barrier_thickness,
- // dishing_thickness, alpha_scatter);
- // ild_thickness = 0.3;
- // wire_c_per_micron[0][6] = wire_capacitance(wire_width,
- // wire_thickness, wire_spacing,
- // ild_thickness, miller_value,
- // horiz_dielectric_constant, vert_dielectric_constant,
- // fringe_cap);
- //*************************
-
- // Conservative projections
- wire_pitch[1][0] = 2.5 * g_ip->F_sz_um;
- aspect_ratio[1][0] = 2.0;
- wire_width = wire_pitch[1][0] / 2;
- wire_thickness = aspect_ratio[1][0] * wire_width;
- wire_spacing = wire_pitch[1][0] - wire_width;
- barrier_thickness = 0.002;
- dishing_thickness = 0;
- alpha_scatter = 1.05;
- wire_r_per_micron[1][0] =
- wire_resistance(CU_RESISTIVITY, wire_width, wire_thickness,
- barrier_thickness, dishing_thickness, alpha_scatter);
- ild_thickness[1][0] = 0.108;
- miller_value[1][0] = 1.5;
- horiz_dielectric_constant[1][0] = 1.998;
- vert_dielectric_constant[1][0] = 3.9;
- fringe_cap = 0.115e-15;
- wire_c_per_micron[1][0] = wire_capacitance(
- wire_width, wire_thickness, wire_spacing, ild_thickness[1][0],
- miller_value[1][0], horiz_dielectric_constant[1][0],
- vert_dielectric_constant[1][0], fringe_cap);
-
- wire_pitch[1][1] = 4 * g_ip->F_sz_um;
- wire_width = wire_pitch[1][1] / 2;
- aspect_ratio[1][1] = 2.0;
- wire_thickness = aspect_ratio[1][1] * wire_width;
- wire_spacing = wire_pitch[1][1] - wire_width;
- wire_r_per_micron[1][1] =
- wire_resistance(CU_RESISTIVITY, wire_width, wire_thickness,
- barrier_thickness, dishing_thickness, alpha_scatter);
- ild_thickness[1][1] = 0.108;
- miller_value[1][1] = 1.5;
- horiz_dielectric_constant[1][1] = 1.998;
- vert_dielectric_constant[1][1] = 3.9;
- wire_c_per_micron[1][1] = wire_capacitance(
- wire_width, wire_thickness, wire_spacing, ild_thickness[1][1],
- miller_value[1][1], horiz_dielectric_constant[1][1],
- vert_dielectric_constant[1][1], fringe_cap);
-
- wire_pitch[1][2] = 8 * g_ip->F_sz_um;
- aspect_ratio[1][2] = 2.2;
- wire_width = wire_pitch[1][2] / 2;
- wire_thickness = aspect_ratio[1][2] * wire_width;
- wire_spacing = wire_pitch[1][2] - wire_width;
- dishing_thickness = 0.1 * wire_thickness;
- wire_r_per_micron[1][2] =
- wire_resistance(CU_RESISTIVITY, wire_width, wire_thickness,
- barrier_thickness, dishing_thickness, alpha_scatter);
- ild_thickness[1][2] = 0.198;
- miller_value[1][2] = 1.5;
- horiz_dielectric_constant[1][2] = 1.998;
- vert_dielectric_constant[1][2] = 3.9;
- wire_c_per_micron[1][2] = wire_capacitance(
- wire_width, wire_thickness, wire_spacing, ild_thickness[1][2],
- miller_value[1][2], horiz_dielectric_constant[1][2],
- vert_dielectric_constant[1][2], fringe_cap);
- // Nominal projections for commodity DRAM wordline/bitline
- wire_pitch[1][3] = 2 * 0.016; // micron
- wire_c_per_micron[1][3] = 31e-15 / (256 * 2 * 0.016); // F/micron
- wire_r_per_micron[1][3] = 12 / 0.016; // ohm/micron
-
- //******************
- // wire_pitch[1][4] = 16 * g_ip.F_sz_um;
- // aspect_ratio = 2.2;
- // wire_width = wire_pitch[1][4] / 2;
- // wire_thickness = aspect_ratio * wire_width;
- // wire_spacing = wire_pitch[1][4] - wire_width;
- // dishing_thickness = 0.1 * wire_thickness;
- // wire_r_per_micron[1][4] = wire_resistance(CU_RESISTIVITY,
- // wire_width, wire_thickness,
- // barrier_thickness, dishing_thickness, alpha_scatter);
- // ild_thickness = 0.275; wire_c_per_micron[1][4] =
- // wire_capacitance(wire_width, wire_thickness, wire_spacing,
- // ild_thickness, miller_value, horiz_dielectric_constant,
- // vert_dielectric_constant, fringe_cap);
- //
- // wire_pitch[1][5] = 24 * g_ip.F_sz_um;
- // aspect_ratio = 2.2;
- // wire_width = wire_pitch[1][5] / 2;
- // wire_thickness = aspect_ratio * wire_width;
- // wire_spacing = wire_pitch[1][5] - wire_width;
- // dishing_thickness = 0.1 * wire_thickness;
- // wire_r_per_micron[1][5] = wire_resistance(CU_RESISTIVITY,
- // wire_width, wire_thickness,
- // barrier_thickness, dishing_thickness, alpha_scatter);
- // ild_thickness = 0.275; wire_c_per_micron[1][5] =
- // wire_capacitance(wire_width, wire_thickness, wire_spacing,
- // ild_thickness, miller_value, horiz_dielectric_constant,
- // vert_dielectric_constant, fringe_cap);
- //
- // wire_pitch[1][6] = 32 * g_ip.F_sz_um;
- // aspect_ratio = 2.2;
- // wire_width = wire_pitch[1][6] / 2;
- // wire_thickness = aspect_ratio * wire_width;
- // wire_spacing = wire_pitch[1][6] - wire_width;
- // dishing_thickness = 0.1 * wire_thickness;
- // wire_r_per_micron[1][6] = wire_resistance(CU_RESISTIVITY,
- // wire_width, wire_thickness,
- // barrier_thickness, dishing_thickness, alpha_scatter);
- // ild_thickness = 0.275; wire_c_per_micron[1][6] =
- // wire_capacitance(wire_width, wire_thickness, wire_spacing,
- // ild_thickness, miller_value, horiz_dielectric_constant,
- // vert_dielectric_constant, fringe_cap);
- }
- g_tp.wire_local.pitch +=
- curr_alpha * wire_pitch[g_ip->ic_proj_type]
- [(ram_cell_tech_type == comm_dram) ? 3 : 0];
- g_tp.wire_local.R_per_um +=
- curr_alpha *
- wire_r_per_micron[g_ip->ic_proj_type]
- [(ram_cell_tech_type == comm_dram) ? 3 : 0];
- g_tp.wire_local.C_per_um +=
- curr_alpha *
- wire_c_per_micron[g_ip->ic_proj_type]
- [(ram_cell_tech_type == comm_dram) ? 3 : 0];
- g_tp.wire_local.aspect_ratio +=
- curr_alpha * aspect_ratio[g_ip->ic_proj_type]
- [(ram_cell_tech_type == comm_dram) ? 3 : 0];
- g_tp.wire_local.ild_thickness +=
- curr_alpha * ild_thickness[g_ip->ic_proj_type]
- [(ram_cell_tech_type == comm_dram) ? 3 : 0];
- g_tp.wire_local.miller_value +=
- curr_alpha * miller_value[g_ip->ic_proj_type]
- [(ram_cell_tech_type == comm_dram) ? 3 : 0];
- g_tp.wire_local.horiz_dielectric_constant +=
- curr_alpha *
- horiz_dielectric_constant[g_ip->ic_proj_type]
- [(ram_cell_tech_type == comm_dram) ? 3 : 0];
- g_tp.wire_local.vert_dielectric_constant +=
- curr_alpha *
- vert_dielectric_constant[g_ip->ic_proj_type]
- [(ram_cell_tech_type == comm_dram) ? 3 : 0];
-
- g_tp.wire_inside_mat.pitch +=
- curr_alpha * wire_pitch[g_ip->ic_proj_type][g_ip->wire_is_mat_type];
- g_tp.wire_inside_mat.R_per_um +=
- curr_alpha *
- wire_r_per_micron[g_ip->ic_proj_type][g_ip->wire_is_mat_type];
- g_tp.wire_inside_mat.C_per_um +=
- curr_alpha *
- wire_c_per_micron[g_ip->ic_proj_type][g_ip->wire_is_mat_type];
- g_tp.wire_inside_mat.aspect_ratio +=
- curr_alpha * aspect_ratio[g_ip->ic_proj_type][g_ip->wire_is_mat_type];
- g_tp.wire_inside_mat.ild_thickness +=
- curr_alpha * ild_thickness[g_ip->ic_proj_type][g_ip->wire_is_mat_type];
- g_tp.wire_inside_mat.miller_value +=
- curr_alpha * miller_value[g_ip->ic_proj_type][g_ip->wire_is_mat_type];
- g_tp.wire_inside_mat.horiz_dielectric_constant +=
- curr_alpha *
- horiz_dielectric_constant[g_ip->ic_proj_type][g_ip->wire_is_mat_type];
- g_tp.wire_inside_mat.vert_dielectric_constant +=
- curr_alpha *
- vert_dielectric_constant[g_ip->ic_proj_type][g_ip->wire_is_mat_type];
-
- g_tp.wire_outside_mat.pitch +=
- curr_alpha * wire_pitch[g_ip->ic_proj_type][g_ip->wire_os_mat_type];
- g_tp.wire_outside_mat.R_per_um +=
- curr_alpha *
- wire_r_per_micron[g_ip->ic_proj_type][g_ip->wire_os_mat_type];
- g_tp.wire_outside_mat.C_per_um +=
- curr_alpha *
- wire_c_per_micron[g_ip->ic_proj_type][g_ip->wire_os_mat_type];
- g_tp.wire_outside_mat.aspect_ratio +=
- curr_alpha * aspect_ratio[g_ip->ic_proj_type][g_ip->wire_os_mat_type];
- g_tp.wire_outside_mat.ild_thickness +=
- curr_alpha * ild_thickness[g_ip->ic_proj_type][g_ip->wire_os_mat_type];
- g_tp.wire_outside_mat.miller_value +=
- curr_alpha * miller_value[g_ip->ic_proj_type][g_ip->wire_os_mat_type];
- g_tp.wire_outside_mat.horiz_dielectric_constant +=
- curr_alpha *
- horiz_dielectric_constant[g_ip->ic_proj_type][g_ip->wire_os_mat_type];
- g_tp.wire_outside_mat.vert_dielectric_constant +=
- curr_alpha *
- vert_dielectric_constant[g_ip->ic_proj_type][g_ip->wire_os_mat_type];
-
- g_tp.unit_len_wire_del =
- g_tp.wire_inside_mat.R_per_um * g_tp.wire_inside_mat.C_per_um / 2;
-
- g_tp.sense_delay += curr_alpha * SENSE_AMP_D;
- g_tp.sense_dy_power += curr_alpha * SENSE_AMP_P;
- // g_tp.horiz_dielectric_constant += horiz_dielectric_constant;
- // g_tp.vert_dielectric_constant += vert_dielectric_constant;
- // g_tp.aspect_ratio += aspect_ratio;
- // g_tp.miller_value += miller_value;
- // g_tp.ild_thickness += ild_thickness;
- }
- g_tp.fringe_cap = fringe_cap;
-
- double rd = tr_R_on(g_tp.min_w_nmos_, NCH, 1);
- double p_to_n_sizing_r = pmos_to_nmos_sz_ratio();
- double c_load = gate_C(g_tp.min_w_nmos_ * (1 + p_to_n_sizing_r), 0.0);
- double tf = rd * c_load;
- g_tp.kinv = horowitz(0, tf, 0.5, 0.5, RISE);
- double KLOAD = 1;
- c_load = KLOAD * (drain_C_(g_tp.min_w_nmos_, NCH, 1, 1, g_tp.cell_h_def) +
- drain_C_(g_tp.min_w_nmos_ * p_to_n_sizing_r, PCH, 1, 1,
- g_tp.cell_h_def) +
- gate_C(g_tp.min_w_nmos_ * 4 * (1 + p_to_n_sizing_r), 0.0));
- tf = rd * c_load;
- g_tp.FO4 = horowitz(0, tf, 0.5, 0.5, RISE);
-}